Search International and National Patent Collections

1. (WO2017032437) PATTERNED BANK STRUCTURES ON SUBSTRATES AND FORMATION METHOD

Pub. No.:    WO/2017/032437    International Application No.:    PCT/EP2016/001290
Publication Date: Fri Mar 03 00:59:59 CET 2017 International Filing Date: Tue Jul 26 01:59:59 CEST 2016
IPC: G03F 7/004
G03F 7/022
Applicants: MERCK PATENT GMBH
Inventors: TAN, Li Wei
MISKIEWICZ, Pawel
SMITH, Graham
Title: PATTERNED BANK STRUCTURES ON SUBSTRATES AND FORMATION METHOD
Abstract:
A photolithiographic method for fabricating bank structures with improved non-wetting properties to form well regions on a substrate using a photoresist composition comprising a cresol novolak resin, a photoactive diazonaphthoquinone sulfonic ester of a polyhydroxybenzophenone compound with at least one free hydroxyl group, and a non-ionic urethane polyglycol fluorosurfactant. Inkjet methods can be used to deposit active materials into the well areas. Color filter arrays and optoelectronic devices such as OLED devices can be made by this method.