Search International and National Patent Collections

1. (WO2017032247) MANUFACTURING METHOD FOR MAGNETIC MASK PLATE FOR EVAPORATION

Pub. No.:    WO/2017/032247    International Application No.:    PCT/CN2016/095610
Publication Date: Fri Mar 03 00:59:59 CET 2017 International Filing Date: Thu Aug 18 01:59:59 CEST 2016
IPC: C23C 14/04
H01L 51/56
Applicants: KUN SHAN POWER STENCIL CO., LTD.
昆山允升吉光电科技有限公司
Inventors: WEI, Zhiling
魏志凌
ZHAO, Lujun
赵录军
WEI, Zhihao
魏志浩
ZHANG, Weiping
张炜平
Title: MANUFACTURING METHOD FOR MAGNETIC MASK PLATE FOR EVAPORATION
Abstract:
A manufacturing method for a magnetic mask plate for evaporation. The method comprises: S1: manufacturing a metal supporting layer; S2: covering the surface of the metal supporting layer with a film; S3: performing exposure on a photoresist film layer; and S4: performing developing on the photoresist film layer. According to the magnetic mask plate manufactured by using the method, an organic mask layer forming the mask plate can be made to be very thin, further, the width of an opening is made to be smaller, so that the final magnetic mask plate can be used for evaporating, to form OLED products with higher resolution.