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1. (WO2017031908) ARRAY SUBSTRATE, PREPARATION METHOD THEREFOR, AND DISPLAY DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2017/031908 International Application No.: PCT/CN2015/100199
Publication Date: 02.03.2017 International Filing Date: 31.12.2015
IPC:
G02F 1/1335 (2006.01)
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
1335
Structural association of optical devices, e.g. polarisers, reflectors, with the cell
Applicants:
京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN/CN]; 中国北京市 朝阳区酒仙桥路10号 No.10 Jiuxianqiao Rd., Chaoyang District Beijing 100015, CN
Inventors:
张锋 ZHANG, Feng; CN
Agent:
中科专利商标代理有限责任公司 CHINA SCIENCE PATENT & TRADEMARK AGENT LTD.; 中国北京市 海淀区西三环北路87号4-1105室 Suite 4-1105, No. 87, West 3rd Ring North Rd., Haidian District Beijing 100089, CN
Priority Data:
201510536219.827.08.2015CN
Title (EN) ARRAY SUBSTRATE, PREPARATION METHOD THEREFOR, AND DISPLAY DEVICE
(FR) SUBSTRAT MATRICIEL, SON PROCÉDÉ DE PRÉPARATION, ET DISPOSITIF D'AFFICHAGE
(ZH) 阵列基板及其制作方法和显示装置
Abstract:
(EN) An array substrate, a preparation method therefor, and a display device. The array substrate comprises: a substrate (100); multiple pixel units, disposed on the substrate (100), each pixel unit comprising multiple functional layers; and light shading assemblies (11), disposed between the adjacent pixel units. Each light shading assembly (11) comprises a light shading layer (11a), a light absorbing layer (11b) covering the light shading layer (11a), and an antireflection layer (11c) covering the light absorbing layer (11b). By arranging antireflection layers (11c) on the light shading assemblies (11), reflection of the light shading assemblies (11) to light of external environment can be reduced, accordingly the display contrast ratio can be improved, and the image display quality can be improved.
(FR) La présente invention concerne un substrat matriciel, son procédé de préparation, et un dispositif d'affichage. Le substrat matriciel comprend : un substrat (100) ; de multiples unités de pixel, disposées sur le substrat (100), chaque unité de pixel comprenant de multiples couches fonctionnelles ; et des ensembles d'ombrage de lumière (11), disposés entre les unités de pixel adjacentes. Chaque ensemble d'ombrage de lumière (11) comprend une couche d'ombrage de lumière (11a), une couche d'absorption de lumière (11b) recouvrant la couche d'ombrage de lumière (11a), et une couche antireflet (11c) recouvrant la couche d'absorption la lumière (11b). En agençant des couches antireflet (11c) sur les ensembles d'ombrage de lumière (11), la réflexion des ensembles d'ombrage de lumière (11) à la lumière de l'environnement extérieur peut être réduite, par conséquent le rapport de contraste d'affichage peut être amélioré, et la qualité d'affichage d'image peut être améliorée.
(ZH) 一种阵列基板及其制作方法和显示装置。阵列基板包括:基板(100);多个像素单元,设置在基板(100)上,每个像素单元包括多个功能层;以及遮光组件(11),设置在相邻的像素单元之间。遮光组件(11)包括:遮光层(11a);覆盖在遮光层(11a)上的光吸收层(11b);以及覆盖在光吸收层(11b)上的减反射层(11c)。通过在遮光组件(11)上设置减反射层(11c),可以减少遮光组件(11)对外部环境光的反射,从而能够改善显示对比度,提高画面显示质量。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)