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1. WO2017021693 - GAS TREATMENT SYSTEM

Publication Number WO/2017/021693
Publication Date 09.02.2017
International Application No. PCT/GB2016/052281
International Filing Date 26.07.2016
IPC
H05H 1/36 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1Generating plasma; Handling plasma
24Generating plasma
26Plasma torches
32using an arc
34Details, e.g. electrodes, nozzles
36Circuit arrangements
B01D 53/32 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
53Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols
32by electrical effects other than those provided for in group B01D61/89
F16K 11/00 2006.01
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
11Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves; Arrangement of valves and flow lines specially adapted for mixing fluid
CPC
B01D 2257/2027
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
2257Components to be removed
20Halogens or halogen compounds
202Single element halogens
2027Fluorine
B01D 2258/0216
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
2258Sources of waste gases
02Other waste gases
0216from CVD treatment or semi-conductor manufacturing
B01D 2259/818
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
2259Type of treatment
80Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
818Employing electrical discharges or the generation of a plasma
B01D 53/323
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
53Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols,
32by electrical effects other than those provided for in group B01D61/00
323by electrostatic effects or by high-voltage electric fields
H05H 1/34
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE
1Generating plasma; Handling plasma
24Generating plasma
26Plasma torches
32using an arc
34Details, e.g. electrodes, nozzles
H05H 1/36
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE
1Generating plasma; Handling plasma
24Generating plasma
26Plasma torches
32using an arc
34Details, e.g. electrodes, nozzles
36Circuit arrangements
Applicants
  • EDWARDS LIMITED [GB]/[GB]
Inventors
  • MAGNI, Simone
  • BOEGNER, Jerome
  • NOH, MinKyeong
  • LEE, JinOk
  • SON, JiYoung
Agents
  • NORTON, Ian Andrew
Priority Data
1513777.104.08.2015GB
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) GAS TREATMENT SYSTEM
(FR) SYSTÈME DE TRAITEMENT DE GAZ
Abstract
(EN)
A method of controlling power output by a power supply configured to supply power to a plasma torch in a gas treatment system, the plasma torch being configured to treat effluent gas received from at least two processing chambers is disclosed, along with a controller and the gas treatment system. The method comprises: receiving at least one input signal, the at least one input signal comprising an indication of a number of processing chambers currently supplying an effluent gas stream to the plasma torch; and in response to the at least one input signal, controlling the power output by the power supply by outputting a control signal to control a rate of flow of the plasma source gas.
(FR)
La présente invention concerne un procédé de commande de la puissance délivrée en sortie par une alimentation électrique conçue pour alimenter une torche à plasma dans un système de traitement de gaz, la torche à plasma étant conçue pour traiter un effluent gazeux reçu en provenance d'au moins deux chambres de traitement, ainsi qu'un dispositif de commande et le système de traitement de gaz. Le procédé comprend les étapes consistant à : recevoir au moins un signal d'entrée, l'au moins un signal d'entrée comprenant une indication d'un certain nombre de chambres de traitement délivrant actuellement un flux d'effluent gazeux jusqu'à la torche à plasma; et, en réponse à l'au moins un signal d'entrée, commander la puissance délivrée en sortie par l'alimentation électrique en délivrant en sortie un signal de commande pour commander le débit d'écoulement du gaz source de plasma.
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