Search International and National Patent Collections

1. (WO2017020328) MANUFACTURING METHOD FOR ARRAY SUBSTRATE

Pub. No.:    WO/2017/020328    International Application No.:    PCT/CN2015/086476
Publication Date: Fri Feb 10 00:59:59 CET 2017 International Filing Date: Tue Aug 11 01:59:59 CEST 2015
IPC: H01L 21/77
Applicants: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD
武汉华星光电技术有限公司
Inventors: LI, Jinlei
李金磊
Title: MANUFACTURING METHOD FOR ARRAY SUBSTRATE
Abstract:
A manufacturing method for an array substrate, comprising forming a light shielding layer (112), an ion barrier layer (113), a buffer layer (114) and a non-crystalline silicon layer (115) on a substrate (111), wherein a raw material for preparing the non-crystalline silicon layer (115) and a mixed raw material containing the element boron are added into a deposition chamber; the non-crystalline silicon layer (115) is converted into a polycrystalline silicon layer (116), the polycrystalline silicon layer (116) is patterned, and a gate insulation layer (117), a first metal layer (118), a protective layer (121) and a second metal layer are formed on the patterned polycrystalline silicon layer (116).