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1. (WO2017019323) SYSTEMS AND METHODS FOR SINGLE MAGNETRON SPUTTERING

Pub. No.:    WO/2017/019323    International Application No.:    PCT/US2016/042389
Publication Date: Fri Feb 03 00:59:59 CET 2017 International Filing Date: Sat Jul 16 01:59:59 CEST 2016
IPC: C23C 14/35
H01J 37/32
G01R 17/02
Applicants: ADVANCED ENERGY INDUSTRIES, INC.
Inventors: CHRISTIE, David
LARSON, Skip, B.
Title: SYSTEMS AND METHODS FOR SINGLE MAGNETRON SPUTTERING
Abstract:
A system and method for single magnetron sputtering are described. One example includes a system having a power supply, a plasma chamber enclosing a substrate, an anode, and a target for depositing a thin film material on the substrate. This example also has a datastore with uncoated anode characterization data and an anode sputtering adjustment system including an anode analysis component to generate a first health value. The first health value is indicative of whether the anode is coated with a dielectric material. This example also has an anode power controller to receive the first health value and provide an anode-energy-control signal to the pulse controller of the pulsed DC power supply to adjust a second anode sputtering energy relative to a first anode sputtering energy to eject at least a portion of the dielectric material from the anode.