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1. (WO2017018314) VAPOR DEPOSITION SOURCE, VAPOR DEPOSITION APPARATUS AND METHOD FOR PRODUCING VAPOR-DEPOSITED FILM

Pub. No.:    WO/2017/018314    International Application No.:    PCT/JP2016/071397
Publication Date: Fri Feb 03 00:59:59 CET 2017 International Filing Date: Fri Jul 22 01:59:59 CEST 2016
IPC: C23C 14/24
H01L 51/50
H05B 33/10
Applicants: SHARP KABUSHIKI KAISHA
シャープ株式会社
Inventors: KAWATO, Shinichi
川戸 伸一
KIKUCHI, Katsuhiro
菊池 克浩
NIBOSHI, Manabu
二星 学
INOUE, Satoshi
井上 智
KOBAYASHI, Yuhki
小林 勇毅
Title: VAPOR DEPOSITION SOURCE, VAPOR DEPOSITION APPARATUS AND METHOD FOR PRODUCING VAPOR-DEPOSITED FILM
Abstract:
Provided is a line source that enables high utilization efficiency of a vapor deposition material, while maintaining a uniform film formation distribution. This line source (10) is provided with slit nozzles (1), each having a length/width ratio from 4 to 50. The width of each slit nozzle (1) is from 1 mm to 5 mm, and the depth of each slit nozzle (1) is from 5 mm to 20 mm.