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1. (WO2017018293) EUV LIGHT MULTI-LAYER MIRROR
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2017/018293 International Application No.: PCT/JP2016/071255
Publication Date: 02.02.2017 International Filing Date: 20.07.2016
IPC:
G02B 5/28 (2006.01) ,G02B 5/08 (2006.01) ,G02B 5/26 (2006.01) ,G21K 1/00 (2006.01) ,G21K 1/06 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
28
Interference filters
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
08
Mirrors
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
26
Reflecting filters
G PHYSICS
21
NUCLEAR PHYSICS; NUCLEAR ENGINEERING
K
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
1
Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
G PHYSICS
21
NUCLEAR PHYSICS; NUCLEAR ENGINEERING
K
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
1
Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
06
using diffraction, refraction, or reflection, e.g. monochromators
Applicants:
エヌ・ティ・ティ・アドバンステクノロジ株式会社 NTT ADVANCED TECHNOLOGY CORPORATION [JP/JP]; 神奈川県川崎市幸区大宮町1310番地 1310 Omiya-cho Saiwai-ku, Kawasaki-shi, Kanagawa 2120014, JP
Inventors:
市丸 智 ICHIMARU,Satoshi; JP
畑山 雅俊 HATAYAMA,Masatoshi; JP
錦野 将元 NISHIKINO,Masaharu; JP
石野 雅彦 ISHINO,Masahiko; JP
Agent:
山川 茂樹 YAMAKAWA,Shigeki; JP
山川 政樹 YAMAKAWA,Masaki; JP
Priority Data:
2015-14748427.07.2015JP
Title (EN) EUV LIGHT MULTI-LAYER MIRROR
(FR) MIROIR MULTICOUCHE POUR LUMIÈRE ULTRAVIOLETTE EXTRÊME (UVE)
(JA) EUV光用多層膜反射鏡
Abstract:
(EN) In order to make it possible to suppress breakage in a mirror that reflects EUV light having high light intensity, this EUV light multi-layer mirror has a Bragg diffraction effect and is formed by alternately stacking a plurality of heavy-element layers (102) and light-element layers (103) on a substrate (101). The heavy-element layers (102) have niobium as a main component, and the light-element layers (103) have silicon as a main component. For instance, heavy-element layers (102) composed of niobium and light-element layers (103) composed of silicon are alternately stacked on a substrate (101) composed of single-crystal silicon.
(FR) Pour permettre d'éviter la rupture d'un miroir qui réfléchit la lumière UVE et présente une intensité lumineuse élevée, le miroir multicouche pour lumière UVE de la présente invention possède un effet de diffraction de Bragg et est formé par l'empilement alterné d'une pluralité de couches (102) d'éléments lourds et de couches (103) d'éléments légers sur un substrat (101). Les couches (102) d'éléments lourds comportent du niobium en tant que composant principal, et les couches (103) d'éléments légers comportent du silicium en tant que composant principal. Par exemple, des couches (102) d'éléments lourds constituées de niobium et des couches (103) d'éléments légers constituées de silicium sont empilées en alternance sur un substrat (101) constitué de silicium monocristallin.
(JA) 高い光強度のEUV光を反射させる反射鏡における破損が抑制できるようにするために、基板(101)の上に、重元素層(102)と軽元素層(103)とが交互に複数積層されてブラッグ回折効果を有するEUV光用多層膜反射鏡とする。また、重元素層(102)はニオブを主成分とし、軽元素層(103)はシリコンを主成分とする。例えば、単結晶シリコンから構成された基板(101)の上に、ニオブから構成された重元素層(102)と、シリコンから構成された軽元素層(103)とが、交互に積層されている。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)