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1. (WO2016190081) FILM OF CYCLOOLEFIN-BASED RESIN COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2016/190081 International Application No.: PCT/JP2016/063847
Publication Date: 01.12.2016 International Filing Date: 10.05.2016
IPC:
C08L 45/00 (2006.01) ,C08L 53/02 (2006.01) ,C08L 65/00 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
45
Compositions of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Compositions of derivatives of such polymers
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
53
Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
02
of vinyl aromatic monomers and conjugated dienes
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
65
Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
Applicants:
デクセリアルズ株式会社 DEXERIALS CORPORATION [JP/JP]; 東京都品川区大崎1丁目11番2号 ゲートシティ大崎イーストタワー8階 Gate City Osaki, East Tower 8F, 1-11-2, Osaki, Shinagawa-ku, Tokyo 1410032, JP
Inventors:
細谷 健 HOSOYA, Ken; JP
堀井 明宏 HORII, Akihiro; JP
沼倉 新一 NUMAKURA, Shinichi; JP
高橋 康弘 TAKAHASHI, Yasuhiro; JP
佐竹 由貴 SATAKE, Yutaka; JP
小幡 慶 OBATA, Kei; JP
前川 欣之 MAEKAWA, Yoshiyuki; JP
石森 拓 ISHIMORI, Taku; JP
Agent:
野口 信博 NOGUCHI, Nobuhiro; JP
Priority Data:
2015-10860528.05.2015JP
2016-08984027.04.2016JP
Title (EN) FILM OF CYCLOOLEFIN-BASED RESIN COMPOSITION
(FR) FILM DE COMPOSITION DE RÉSINE À BASE DE CYCLOOLÉFINE
(JA) 環状オレフィン系樹脂組成物フィルム
Abstract:
(EN) Provided is a film of a cycloolefin-based resin composition, the film having few defects. The film of a cycloolefin-based resin composition comprises a cycloolefin-based resin and an antioxidant, the antioxidant satisfying at least one of the following requirements (1) to (3). (1) To have a lithium ion content of 0.4 ppm or less. (2) To have a cation content of 0.9 ppm or less. (3) To have a chloride ion content of 0.1 ppm or less.
(FR) La présente invention concerne un film d'une composition de résine à base de cyclooléfine, ledit film ne présentant que peu de défauts. Ledit film d'une composition de résine à base de cyclooléfine comprend une résine à base de cyclooléfine et un antioxydant, ledit antioxydant satisfaisant à au moins une des exigences (1) à (3) suivantes. (1) Présenter une teneur en ions lithium inférieure ou égale à 0,4 ppm. (2) Présenter une teneur en cations inférieure ou égale à 0,9 ppm. (3) Présenter une teneur en ions chlorure inférieure ou égale à 0,1 ppm.
(JA) 欠陥が少ない環状オレフィン系樹脂組成物フィルムを提供する。 環状オレフィン系樹脂組成物フィルムは、環状オレフィン系樹脂と酸化防止剤とを含有し、上記酸化防止剤が以下の(1)~(3)の条件の少なくとも1つを満たす。 (1)上記酸化防止剤に含まれるリチウムイオンの含有量が0.4ppm以下である。 (2)上記酸化防止剤に含まれる陽イオンの含有量が0.9ppm以下である。 (3)上記酸化防止剤に含まれる塩化物イオンの含有量が0.1ppm以下である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)