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1. (WO2016186214) METHOD FOR POLISHING GLASS SUBSTRATE, POLISHING LIQUID, METHOD FOR MANUFACTURING GLASS SUBSTRATE, METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MAGNETIC DISC, AND METHOD FOR MANUFACTURING MAGNETIC DISC
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/186214    International Application No.:    PCT/JP2016/065103
Publication Date: 24.11.2016 International Filing Date: 20.05.2016
IPC:
G11B 5/84 (2006.01), B24B 37/00 (2012.01), C09G 1/02 (2006.01), C09K 3/14 (2006.01), G11B 5/73 (2006.01)
Applicants: HOYA CORPORATION [JP/JP]; 6-10-1,Nishi-Shinjuku,Shinjuku-ku, Tokyo 1608347 (JP)
Inventors: NAKAGAWA Hiroki; (JP)
Agent: OTSUKA Takefumi; (JP)
Priority Data:
2015-102786 20.05.2015 JP
Title (EN) METHOD FOR POLISHING GLASS SUBSTRATE, POLISHING LIQUID, METHOD FOR MANUFACTURING GLASS SUBSTRATE, METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MAGNETIC DISC, AND METHOD FOR MANUFACTURING MAGNETIC DISC
(FR) PROCÉDÉ DE POLISSAGE DE SUBSTRAT DE VERRE, LIQUIDE DE POLISSAGE, PROCÉDÉ DE FABRICATION DE SUBSTRAT DE VERRE, PROCÉDÉ DE FABRICATION DE SUBSTRAT DE VERRE POUR DISQUE MAGNÉTIQUE, ET PROCÉDÉ DE FABRICATION DE DISQUE MAGNÉTIQUE
(JA) ガラス基板の研磨方法、研磨液、ガラス基板の製造方法、磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法
Abstract: front page image
(EN)The present invention provides a method for manufacturing a glass substrate, in which polishing speed can be improved in a polishing process of using cerium oxide as polishing abrasive grains to polish the surface of a glass substrate. The method for polishing a glass substrate according to the present invention comprises polishing the surface of the glass substrate by supplying a polishing liquid containing cerium oxide as polishing abrasive grains to a polishing surface of the glass substrate. An alkaline liquid that contains the cerium oxide as polishing abrasive grains and also contains an inorganic reducing agent is used as the polishing liquid.
(FR)La présente invention concerne un procédé de fabrication d'un substrat de verre, dans lequel la vitesse de polissage peut être améliorée dans un processus de polissage consistant à utiliser de l'oxyde de cérium comme grains abrasifs de polissage pour polir la surface d'un substrat de verre. Le procédé de polissage d'un substrat en verre selon la présente invention comprend le polissage de la surface du substrat de verre en appliquant un liquide de polissage, contenant de l'oxyde de cérium comme grains abrasifs de polissage, sur une surface de polissage du substrat de verre. Un liquide alcalin qui contient de l'oxyde de cérium comme grains abrasifs de polissage et contient également un agent réducteur inorganique est utilisé comme liquide de polissage.
(JA)本発明は、酸化セリウムを研磨砥粒としてガラス基板の表面を研磨する研磨処理において、研磨速度を向上できるガラス基板の研磨方法を提供する。 本発明に係るガラス基板の研磨方法は、ガラス基板の研磨面に、酸化セリウムを研磨砥粒として含む研磨液を供給してガラス基板の表面を研磨処理する方法である。ここで、上記研磨液として、上記酸化セリウムを研磨砥粒として含み、さらに無機還元剤を含むとともに、アルカリ性であるものを使用する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)