Search International and National Patent Collections

1. (WO2016186046) SUBSTRATE DESTATICIZING MECHANISM AND VACUUM TREATMENT APPARATUS USING SAME

Pub. No.:    WO/2016/186046    International Application No.:    PCT/JP2016/064361
Publication Date: Fri Nov 25 00:59:59 CET 2016 International Filing Date: Sat May 14 01:59:59 CEST 2016
IPC: C23C 14/58
C23C 16/56
Applicants: ULVAC, INC.
株式会社アルバック
Inventors: HIRONO Takayoshi
廣野 貴啓
Title: SUBSTRATE DESTATICIZING MECHANISM AND VACUUM TREATMENT APPARATUS USING SAME
Abstract:
Provided is a technique which is used for, for example, devices for forming a film on a film-like substrate in vacuum and allows efficient destaticization using a simple structure without affecting a treated region. The present invention also provides a substrate destaticizing mechanism which destaticizes, by magnetron discharge, a film formation film 10 being transported in vacuum. According to the present invention, the substrate destaticizing mechanism comprises: a housing 51 to which a discharge gas is introduced; linear discharge electrodes 53 which are disposed perpendicular to the direction of transportation of the substrate in the housing 51 and to which a predetermined voltage is applied; and magnets 54A disposed near the discharge electrodes 53. The magnets 54A are disposed so as to cause an electrical discharge according to the distribution of the charge amount in the film formation film 10.