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1. (WO2016181922) RELEASE SOLVENT COMPOSITION, RELEASE METHOD, AND CLEANING SOLVENT COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/181922    International Application No.:    PCT/JP2016/063708
Publication Date: 17.11.2016 International Filing Date: 09.05.2016
IPC:
C09D 9/00 (2006.01), C08J 11/06 (2006.01), C11D 7/26 (2006.01), C11D 7/30 (2006.01), C11D 7/32 (2006.01)
Applicants: ZEON CORPORATION [JP/JP]; 6-2, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008246 (JP)
Inventors: ANDO Keiji; (JP).
OTSUKI Noriyasu; (JP)
Agent: FUJIMOTO Yoshihiro; (JP)
Priority Data:
2015-098865 14.05.2015 JP
2015-148240 28.07.2015 JP
Title (EN) RELEASE SOLVENT COMPOSITION, RELEASE METHOD, AND CLEANING SOLVENT COMPOSITION
(FR) COMPOSITION DE SOLVANT DE DÉMOULAGE, PROCÉDÉ DE DÉMOULAGE, ET COMPOSITION DE SOLVANT DE NETTOYAGE
(JA) 剥離溶剤組成物、剥離方法および洗浄溶剤組成物
Abstract: front page image
(EN)A release solvent composition for releasing a thermosetting resin coating film coated on a thermoplastic resin molded article, the release solvent composition containing 1,1,2,2,3,3,4-heptafluorocyclopentane and aromatic alcohols and having no flash point.
(FR)L'invention concerne une composition de solvant de démoulage pour démouler un film de revêtement de résine thermodurcissable appliqué sur un article moulé en résine thermoplastique, la composition de solvant de démoulage contenant du 1,1,2,2,3,3,4-heptafluorocyclopentane et des alcools aromatiques et ne possède pas de point d'éclair.
(JA)熱可塑性樹脂成型品に塗装された熱硬化性樹脂塗膜を剥離する剥離溶剤組成物であって、1,1,2,2,3,3,4-ヘプタフルオロシクロペンタン及び芳香族アルコール類を含有し、引火点を有しない。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)