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1. (WO2016179023) METHODS AND DEVICES FOR THE HIGH-VOLUME PRODUCTION OF SILICON CHIPS WITH UNIFORM ANTI-REFLECTIVE COATINGS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/179023    International Application No.:    PCT/US2016/030212
Publication Date: 10.11.2016 International Filing Date: 29.04.2016
IPC:
B44C 1/22 (2006.01), C23F 1/08 (2006.01), H01L 21/302 (2006.01), G01B 13/06 (2006.01), G06F 19/00 (2011.01)
Applicants: ADARZA BIOSYSTEMS, INC. [US/US]; 150 Lucius Gordon Drive Suite 100 West Henrietta, New York 14586 (US)
Inventors: STRIEMER, Christopher C.; (US).
CARTER, Jared A.; (US).
CAMPNEY, Wade; (US)
Agent: DEAN III, Elton F.; (US)
Priority Data:
62/155,861 01.05.2015 US
Title (EN) METHODS AND DEVICES FOR THE HIGH-VOLUME PRODUCTION OF SILICON CHIPS WITH UNIFORM ANTI-REFLECTIVE COATINGS
(FR) PROCÉDÉS ET DISPOSITIFS POUR LA PRODUCTION À VOLUME ÉLEVÉ DE PUCES DE SILICIUM À REVÊTEMENTS ANTIRÉFLÉCHISSANTS
Abstract: front page image
(EN)This present disclosure generally relates to devices, methods, and systems for producing large numbers of SiO2 coated silicon chips with uniform film thickness controlled to angstrom and sub angstrom levels. The disclosure further relates to etching plates configured for receiving a plurality of chips mounted thereon.
(FR)La présente invention concerne de manière générale des dispositifs, des procédés et des systèmes pour produire de grands nombres de puces de silicium revêtues de SiO2 dont l'épaisseur de film uniforme est régulée à des niveaux de l'ordre de l'angström et du sous-angström. L'invention concerne en outre la gravure de plaques conçues pour recevoir une pluralité de puces montées sur celles-ci.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)