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1. (WO2016178403) METHOD FOR PRODUCING INDIUM-CONTAINING OXIDE FILM, INDIUM-CONTAINING OXIDE FILM, THIN-FILM TRANSISTOR, AND ELECTRONIC DEVICE AND FILM FORMING APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/178403    International Application No.:    PCT/JP2016/063287
Publication Date: 10.11.2016 International Filing Date: 27.04.2016
IPC:
H01L 21/365 (2006.01), H01L 21/336 (2006.01), H01L 27/146 (2006.01), H01L 29/786 (2006.01), H01L 51/50 (2006.01)
Applicants: FUJIFILM CORPORATION [JP/JP]; 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620 (JP)
Inventors: TAKATA, Masahiro; (JP).
UMEDA, Kenichi; (JP).
MOCHIZUKI, Fumihiko; (JP).
TANAKA, Atsushi; (JP)
Agent: NAKAJIMA, Jun; (JP)
Priority Data:
2015-094430 01.05.2015 JP
Title (EN) METHOD FOR PRODUCING INDIUM-CONTAINING OXIDE FILM, INDIUM-CONTAINING OXIDE FILM, THIN-FILM TRANSISTOR, AND ELECTRONIC DEVICE AND FILM FORMING APPARATUS
(FR) PROCÉDÉ DE FABRICATION DE FILM D'OXYDE CONTENANT DE L'INDIUM, FILM D'OXYDE CONTENANT DE L'INDIUM, TRANSISTOR À COUCHES MINCES, DISPOSITIF ÉLECTRONIQUE ET APPAREIL DE FORMATION DE FILM
(JA) インジウム含有酸化物膜の製造方法、インジウム含有酸化物膜、薄膜トランジスタ、及び電子デバイス並びに成膜装置
Abstract: front page image
(EN)One embodiment of the present invention provides a method for producing an indium-containing oxide film and an application thereof, the method comprising a step for spraying a solution containing a solvent, indium ions, and nitric acid ions onto a heated substrate, and irradiating the substrate with ultraviolet light from an ultraviolet light source while supplying inert gas in a direction from the ultraviolet light source toward the substrate, to form the indium-containing oxide film on the substrate.
(FR)Selon un mode de réalisation, la présente invention concerne un procédé de fabrication d'un film d'oxyde contenant de l'indium et une application de ce film, le procédé comprenant une étape qui consiste à pulvériser une solution contenant un solvant, des ions indium et des ions acide nitrique sur un substrat chauffé, et à exposer le substrat à de la lumière ultraviolette provenant d'une source de lumière ultraviolette tout en fournissant un gaz inerte dans une direction allant de la source de lumière ultraviolette vers le substrat, afin de former le film d'oxyde contenant de l'indium sur le substrat.
(JA)本発明の一実施形態は、溶媒、インジウムイオン及び硝酸イオンを含む溶液を、加熱された基板上に噴霧し、かつ、紫外線光源から基板に向かう方向に不活性ガスを供給しながら紫外線光源から基板に対して紫外線照射を行うことにより基板上にインジウム含有酸化物膜を形成する工程を有するインジウム含有酸化物膜の製造方法及びその応用を提供する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)