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1. (WO2016176267) MAGNETICALLY TUNABLE PHOTONIC CRYSTALS BASED ON ANISOTROPIC NANOSTRUCTURES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/176267    International Application No.:    PCT/US2016/029461
Publication Date: 03.11.2016 International Filing Date: 27.04.2016
IPC:
H01F 1/032 (2006.01), C01G 49/00 (2006.01)
Applicants: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA [US/US]; 5th Floor 1111 Franklin Street Oakland, California 94607 (US)
Inventors: YIN, Yadong; (US).
WANG, Mingsheng; (US)
Agent: NUZUM, Kirk M.; (US)
Priority Data:
62/153,228 27.04.2015 US
Title (EN) MAGNETICALLY TUNABLE PHOTONIC CRYSTALS BASED ON ANISOTROPIC NANOSTRUCTURES
(FR) CRISTAUX PHOTONIQUES ACCORDABLES MAGNÉTIQUEMENT BASÉS SUR DES NANOSTRUCTURES ANISOTROPES
Abstract: front page image
(EN)A method is disclosed of forming magnetically tunable photonic crystals comprising: synthesizing one or more precursory nanoparticles with anisotropic shapes; coating the one or more anisotropic precursory nanoparticles with silica to form composite structures; converting the one or more anisotropic precursory nanoparticles into magnetic nanomaterials through chemical reactions; and assembling the anisotropic magnetic nanoparticles into photonic crystals in a solvent.
(FR)L'invention concerne un procédé de formation de cristaux photoniques accordables magnétiquement, comportant les étapes consistant à: synthétiser une ou plusieurs nanoparticules précurseurs de formes anisotropes; revêtir la ou les nanoparticules précurseurs anisotropes avec de la silice pour former des structures composites; convertir la ou les nanoparticules précurseurs anisotropes en nanomatériaux magnétiques par des réactions chimiques; et assembler les nanoparticules magnétiques anisotropes en cristaux photoniques dans un solvant.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)