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1. WO2016137709 - THERMAL INTERFACE MATERIALS USING METAL NANOWIRE ARRAYS AND SACRIFICIAL TEMPLATES

Publication Number WO/2016/137709
Publication Date 01.09.2016
International Application No. PCT/US2016/016584
International Filing Date 04.02.2016
IPC
H01L 23/373 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
23Details of semiconductor or other solid state devices
34Arrangements for cooling, heating, ventilating or temperature compensation
36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heat sinks
373Cooling facilitated by selection of materials for the device
B82Y 30/00 2011.01
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE  OR TREATMENT OF NANOSTRUCTURES
30Nanotechnology for materials or surface science, e.g. nanocomposites
CPC
B32B 15/01
BPERFORMING OPERATIONS; TRANSPORTING
32LAYERED PRODUCTS
BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
15Layered products comprising ; a layer of; metal
01all layers being exclusively metallic
B82Y 30/00
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
30Nanotechnology for materials or surface science, e.g. nanocomposites
B82Y 40/00
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
40Manufacture or treatment of nanostructures
C25D 1/006
CCHEMISTRY; METALLURGY
25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
1Electroforming
006Nanostructures, e.g. using aluminium anodic oxidation templates [AAO]
C25D 1/04
CCHEMISTRY; METALLURGY
25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
1Electroforming
04Wires; Strips; Foils
C25D 5/022
CCHEMISTRY; METALLURGY
25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
5Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
02Electroplating of selected surface areas
022using masking means
Applicants
  • NORTHROP GRUMMAN SYSTEMS CORPORATION [US]/[US]
  • THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIV. OFFICE OF THE GENERAL COUNSEL [US]/[US]
Inventors
  • SILVERMAN, Edward, M.
  • STARKOVICH, John, A.
  • PENG, Hsiao-hu
  • TICE, Jesse, B.
  • BARAKO, Michael, T.
  • COYAN, Conor, E.
  • GOODSON, Kenneth, E.
Agents
  • PATTI, Carmen, B.
Priority Data
15/006,59726.01.2016US
62/121,01026.02.2015US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) THERMAL INTERFACE MATERIALS USING METAL NANOWIRE ARRAYS AND SACRIFICIAL TEMPLATES
(FR) MATÉRIAUX D'INTERFACE THERMIQUE UTILISANT DES RÉSEAUX DE NANOFILS MÉTALLIQUES ET DES GABARITS SACRIFICIELS
Abstract
(EN)
A method for making a thermal interface material (TIM) comprises the steps of: depositing a seed layer onto a substrate; attaching a template membrane to the substrate; depositing metal into one or more of the pores of the template membrane, substantially filling the template membrane to create a vertically- aligned metal nanowire (MNW) array comprising a plurality of nanowires that grow upward from the seed layer; and after the template membrane is substantially filled with the deposited metal, removing the template membrane, leaving the plurality of nanowires attached to the seed layer. A TIM comprises: a vertically- aligned MNW array comprising a plurality of nanowires that grow upward from a seed layer deposited on the surface of a template membrane, and the template membrane being removed after MNW growth.
(FR)
Procédé de fabrication d'un matériau d'interface thermique (TIM) comprenant les étapes consistant à : déposer une couche de germe sur un substrat ; fixer une membrane de gabarit au substrat ; déposer du métal dans un ou plusieurs des pores de la membrane de gabarit, remplissant sensiblement la membrane de gabarit pour créer un réseau de nanofils métalliques (MNW) alignés verticalement comprenant une pluralité de nanofils qui se développent vers le haut à partir de la couche de germe ; et après que la membrane de gabarit a été sensiblement remplie du métal déposé, retirer la membrane gabarit, laissant la pluralité de nanofils fixés à la couche de germe. Un TIM comprend : un réseau de MNW alignés verticalement comprenant une pluralité de nanofils qui se développent vers le haut à partir d'une couche de germe déposée sur la surface d'une membrane de gabarit, et la membrane de gabarit étant retirée après le développement de MNW.
Also published as
Latest bibliographic data on file with the International Bureau