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1. WO2016136481 - PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR PRODUCING ELECTRONIC DEVICE USING THESE, AND ELECTRONIC DEVICE

Publication Number WO/2016/136481
Publication Date 01.09.2016
International Application No. PCT/JP2016/054019
International Filing Date 10.02.2016
IPC
G03F 7/039 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
039Macromolecular compounds which are photodegradable, e.g. positive electron resists
C08F 12/14 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
12Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
02Monomers containing only one unsaturated aliphatic radical
04containing one ring
14substituted by hetero atoms or groups containing hetero atoms
C08F 20/02 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
20Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
C08F 12/14
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
12Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
02Monomers containing only one unsaturated aliphatic radical
04containing one ring
14substituted by hetero atoms or groups containing heteroatoms
C08F 20/02
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
20Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
G03F 7/039
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
039Macromolecular compounds which are photodegradable, e.g. positive electron resists
G03F 7/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
Applicants
  • 富士フイルム株式会社 FUJIFILM CORPORATION [JP]/[JP]
Inventors
  • 高田 暁 TAKADA, Akira
  • 平野 修史 HIRANO, Shuji
  • 望月 英宏 MOCHIZUKI, Hidehiro
  • 高橋 年哉 TAKAHASHI, Toshiya
  • 福原 敏明 FUKUHARA, Toshiaki
Agents
  • 蔵田 昌俊 KURATA, Masatoshi
Priority Data
2015-03946827.02.2015JP
2015-05086113.03.2015JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR PRODUCING ELECTRONIC DEVICE USING THESE, AND ELECTRONIC DEVICE
(FR) PROCÉDÉ DE FORMATION DE MOTIFS, COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU AUX RAYONNEMENTS, FILM SENSIBLE AUX RAYONS ACTINIQUES OU AUX RAYONNEMENTS, PROCÉDÉ DE PRODUCTION DE DISPOSITIF ÉLECTRONIQUE, ET DISPOSITIF ÉLECTRONIQUE
(JA) パターン形成方法、感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、これらを用いた電子デバイスの製造方法、及び、電子デバイス
Abstract
(EN)
Provided is a pattern forming method comprising a step in which a film is formed using an actinic ray-sensitive or radiation-sensitive resin composition, a step in which the film is exposed, and a step in which the film is developed using a developer after exposure, and a positive pattern is formed. The actinic ray-sensitive or radiation-sensitive resin composition contains a resin (P1) comprising at least a repeating unit (a) represented by general formula (1) as a repeating unit having a group that produces a polar group as a result of being decomposed by the action of an acid.
(FR)
L'invention concerne un procédé de formation de motifs comprenant une étape dans laquelle un film est formé à l'aide d'une composition de résine sensible aux rayons actiniques ou aux rayonnements, une étape dans laquelle le film est exposé, et une étape dans laquelle le film est développé à l'aide d'un révélateur après exposition, et un motif positif est formé. La composition de résine sensible aux rayons actiniques ou aux rayonnements contient une résine (P1) comprenant au moins une unité de répétition (a) représentée par la formule (1) en tant qu'unité de répétition ayant un groupe qui produit un groupe polaire en tant que résultat d'une décomposition sous l'action d'un acide.
(JA)
感活性光線性又は感放射線性樹脂組成物を用いて膜を形成する工程、上記膜を露光する工程、及び、露光後の上記膜を、現像液を用いて現像し、ポジ型のパターンを形成する工程を含むパターン形成方法が提供される。上記感活性光線性又は感放射線性樹脂組成物は、酸の作用により分解して極性基を生じる基を有する繰り返し単位として、少なくとも下記一般式(1)で表される繰り返し単位(a)を含む樹脂(P1)を含有する。
Also published as
Latest bibliographic data on file with the International Bureau