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1. WO2016135406 - METHOD FOR NUMERICAL CALCULATION OF THE DIFFRACTION OF A STRUCTURE

Publication Number WO/2016/135406
Publication Date 01.09.2016
International Application No. PCT/FR2016/050408
International Filing Date 22.02.2016
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G01N 21/47 2006.01
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
17Systems in which incident light is modified in accordance with the properties of the material investigated
47Scattering, i.e. diffuse reflection
G21K 1/06 2006.01
GPHYSICS
21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
1Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
06using diffraction, refraction, or reflection, e.g. monochromators
CPC
G03F 7/70158
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70058Mask illumination systems
7015Details of optical elements
70158Diffractive optical elements
G03F 7/70316
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70316Details of optical elements, e.g. of Bragg reflectors or diffractive optical elements
G03F 7/705
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
70491Information management and control, including software
705Modelling and simulation from physical phenomena up to complete wafer process or whole workflow in wafer fabrication
G03F 7/70958
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
7095Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
70958Optical materials and coatings, e.g. with particular transmittance, reflectance
G06F 17/12
GPHYSICS
06COMPUTING; CALCULATING; COUNTING
FELECTRIC DIGITAL DATA PROCESSING
17Digital computing or data processing equipment or methods, specially adapted for specific functions
10Complex mathematical operations
11for solving equations ; , e.g. nonlinear equations, general mathematical optimization problems
12Simultaneous equations ; , e.g. systems of linear equations
Applicants
  • UNIVERSITÉ JEAN MONNET SAINT ETIENNE [FR]/[FR]
  • CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE [FR]/[FR]
  • IFF, Wolfgang [DE]/[DE]
Inventors
  • IFF, Wolfgang
  • TISHCHENKO, Alexandre
Agents
  • GUERIN, Jean-Philippe
Priority Data
155158924.02.2015FR
Publication Language French (FR)
Filing Language French (FR)
Designated States
Title
(EN) METHOD FOR NUMERICAL CALCULATION OF THE DIFFRACTION OF A STRUCTURE
(FR) PROCÉDÉ DE CALCUL NUMÉRIQUE DE LA DIFFRACTION D'UNE STRUCTURE
Abstract
(EN)
The invention relates to a method for numerical calculation of the diffraction of a structure (1), wherein a numerical model defines the dielectric permittivity at each point, comprising the steps of: - defining a numerical modelling of a diffraction model of a structure, including: - splitting the numerical model of dielectric permittivity into N numerical models of dielectric permittivity; - determining the diffraction model of said layers starting from the numerical model of said layer; - numerically calculating the diffraction of the structure, including: - an initial iteration during which: - a wave propagation is performed in the direction of layers 1 to N, - and a wave propagation is performed in the direction of layers N to 1, - subsequent iterations are performed, each subsequent iteration of index k including: - a wave propagation in the direction of layers 2 to N: - a wave propagation in the direction of layers N-1 to 1.
(FR)
L'invention concerne un procédé de calcul numérique de la diffraction d'une structure (1) dont un modèle numérique définit la permittivité diélectrique en chaque point, comprenant les étapes de : -définition d'une modélisation numérique d'un modèle de diffraction d'une structure, incluant : -la scission du modèle numérique de permittivité diélectrique en N de modèles numériques de permittivité diélectrique; -la détermination du modèle de diffraction desdites couches à partir du modèle numérique de cette couche; -calcul numérique de la diffraction de la structure, incluant : -une itération initiale durant laquelle on réalise : -une propagation d'onde dans le sens des couches 1 vers N, -et une propagation d'onde dans le sens des couches N vers 1, -des itérations ultérieures, chaque itération ultérieure d'indice k incluant : -une propagation d'onde dans le sens des couches 2 vers N: -une propagation d'onde dans le sens des couches N-1 vers 1.
Also published as
Latest bibliographic data on file with the International Bureau