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1. (WO2016098561) ISOCYANATE COMPOUND MANUFACTURING METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/098561    International Application No.:    PCT/JP2015/083356
Publication Date: 23.06.2016 International Filing Date: 27.11.2015
IPC:
C07C 263/10 (2006.01), C07C 265/12 (2006.01)
Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED [JP/JP]; 27-1, Shinkawa 2-chome, Chuo-ku, Tokyo 1048260 (JP)
Inventors: YOSHIMOTO, Yuya; (JP).
HIROTA, Masaji; (JP)
Agent: NAKAYAMA, Tohru; (JP)
Priority Data:
2014-254824 17.12.2014 JP
2015-002061 08.01.2015 JP
Title (EN) ISOCYANATE COMPOUND MANUFACTURING METHOD
(FR) PROCÉDÉ DE PRODUCTION D'UN COMPOSÉ ISOCYANATE
(JA) イソシアネート化合物の製造方法
Abstract: front page image
(EN)By reacting 3-methyl-2-methoxymethyl aniline, etc. with a phosgene compound in the presence of a tertiary amine at 10°C-14°C in at least one kind of solvent selected from a group consisting of chlorobenzene and ortho-dichlorobenzene, an isocyanate compound such as 3-methyl-2-methoxymethyl-1-isocyanatobenzene can be manufactured with good yields.
(FR)Par la réaction de 3-méthyl -2-méthoxyméthyl aniline, etc. avec un composé phosgène en présence d'une amine tertiaire à une température de 10 °C à 14 °C dans au moins un type de solvant choisi dans un groupe constitué par le chlorobenzène et l'ortho-dichlorobenzène, on peut produire avec un bon rendement un composé isocyanate, tel que le 3-méthyl-2-méthoxyméthyl-1-isocyanatobenzène.
(JA)クロロベンゼンおよびオルトジクロロベンゼンからなる群より選ばれる1種以上の溶媒中で、3-メチル-2-メトキシメチルアニリン等とホスゲン化合物とを3級アミン存在下、10℃~14℃で反応させることにより、3-メチル-2-メトキシメチル-1-イソシアナトベンゼン等のイソシアネート化合物を収率よく製造することができる。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)