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1. (WO2016098346) PHOTOCURABLE COMPOSITION FOR IMPRINT, METHOD OF PRODUCING CURED FILM, METHOD OF PRODUCING OPTICAL COMPONENT, METHOD OF PRODUCING CIRCUIT BOARD, AND METHOD OF PRODUCING ELECTRONIC COMPONENT
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/098346    International Application No.:    PCT/JP2015/006246
Publication Date: 23.06.2016 International Filing Date: 15.12.2015
IPC:
H01L 21/027 (2006.01), B29C 59/02 (2006.01), C08F 2/50 (2006.01)
Applicants: CANON KABUSHIKI KAISHA [JP/JP]; 30-2, Shimomaruko 3-chome, Ohta-ku, Tokyo 1468501 (JP)
Inventors: SAKAMOTO, Kazumi; (JP).
ITO, Toshiki; (JP).
IIMURA, Akiko; (JP).
KATO, Jun; (JP).
YAMASHITA, Keiji; (JP)
Agent: ABE, Takuma; (JP)
Priority Data:
2014-257797 19.12.2014 JP
Title (EN) PHOTOCURABLE COMPOSITION FOR IMPRINT, METHOD OF PRODUCING CURED FILM, METHOD OF PRODUCING OPTICAL COMPONENT, METHOD OF PRODUCING CIRCUIT BOARD, AND METHOD OF PRODUCING ELECTRONIC COMPONENT
(FR) COMPOSITION PHOTODURCISSABLE POUR IMPRESSION, PROCÉDÉ DE FABRICATION DE FILM DURCI, PROCÉDÉ DE FABRICATION DE COMPOSANT OPTIQUE, PROCÉDÉ DE FABRICATION DE CARTE DE CIRCUIT IMPRIMÉ, ET PROCÉDÉ DE FABRICATION DE COMPOSANT ÉLECTRONIQUE
Abstract: front page image
(EN)The present invention relates to a photocurable composition for imprint in a condensable gas atmosphere. The composition at least includes a polymerizable compound component (A) and photopolymerization initiator component (B) and satisfies the Requirement (1): a value ECG of greater than or equal to 2.30 GPa, where ECG denotes the reduced modulus (GPa) of a photocured film prepared by exposing the photocurable composition for imprint to light at an exposure dose of 200 mJ/cm2 in an atmosphere containing a condensable gas in a concentration of 90% by volume or more.
(FR)La présente invention concerne une composition photodurcissable pour impression dans une atmosphère de gaz condensable. La composition comprend au moins un composant composé polymérisable (A) et un composant initiateur de photopolymérisation (B) et satisfait l'exigence (1) : une valeur ECG supérieure ou égale à 2,30 GPa, ECG représentant le module réduit (GPa) d'un film photodurci préparé par exposition de la composition photodurcissable pour impression à de la lumière à une dose d'exposition de 200 mJ/cm2 dans une atmosphère contenant un gaz condensable en une concentration de 90 % en volume ou plus.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)