WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2016097915) CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR HIGH EFFECTIVE POLISHING OF SUBSTRATES COMPRISING GERMANIUM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/097915    International Application No.:    PCT/IB2015/059351
Publication Date: 23.06.2016 International Filing Date: 04.12.2015
IPC:
C09G 1/02 (2006.01), C09K 3/14 (2006.01)
Applicants: BASF SE [DE/DE]; Carl-Bosch-Str. 38 67056 Ludwigshafen am Rhein (DE).
BASF (CHINA) COMPANY LIMITED [CN/CN]; No. 300 Jiang Xin Sha Road Pudong Shanghai 200137 (CN) (MN only)
Inventors: SIEBERT, DR., Max; (DE).
LAUTER, DR., Michael; (DE).
LAN, Yongqing; (DE).
REICHARDT, DR., Robert; (DE).
MUENCH, Alexandra; (DE).
SIX, Manuel; (DE).
DANIEL, Gerald; (DE).
NOLLER, DR., Bastian Marten; (DE).
HUANG, Kevin; (TW).
USMAN IBRAHIM, Sheik Ansar; (BE)
Agent: ROSENDAHL, Tobias; (DE)
Priority Data:
14198297.5 16.12.2014 EP
Title (EN) CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR HIGH EFFECTIVE POLISHING OF SUBSTRATES COMPRISING GERMANIUM
(FR) COMPOSITION DE POLISSAGE MÉCANO-CHIMIQUE (CMP) POUR LE POLISSAGE TRÈS EFFICACE DE SUBSTRATS COMPRENANT DU GERMANIUM
Abstract: front page image
(EN)A chemical mechanical polishing (CMP) composition (Q) comprising: (A) inorganic particles, (B) a compound of general formula (I) (C) an aqueous medium wherein the composition (Q) has a pH of from 2 to 6.
(FR)Cette invention concerne une composition (Q) de polissage mécano-chimique (CMP) comprenant : (A) des particules inorganiques, (B) un composé de formule générale (I), et (C) un milieu aqueux, la composition (Q) ayant un pH de 2 à 6.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)