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1. (WO2016096351) METHOD AND APPARATUS FOR USING PATTERNING DEVICE TOPOGRAPHY INDUCED PHASE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/096351    International Application No.:    PCT/EP2015/077665
Publication Date: 23.06.2016 International Filing Date: 25.11.2015
IPC:
G03F 7/20 (2006.01), G03F 1/00 (2012.01)
Applicants: ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven (NL)
Inventors: FINDERS, Jozef, Maria; (NL)
Agent: PETERS, John; (NL)
Priority Data:
62/093,363 17.12.2014 US
Title (EN) METHOD AND APPARATUS FOR USING PATTERNING DEVICE TOPOGRAPHY INDUCED PHASE
(FR) PROCÉDÉ ET APPAREIL POUR L'UTILISATION D'UNE PHASE INDUITE PAR LA TOPOGRAHIE D'UN DISPOSITIF DE FORMATION DE MOTIFS
Abstract: front page image
(EN)A method includes measuring a three-dimensional topography of a feature of a pattern of a lithography patterning device and calculating from the measurements wavefront phase information caused by the three-dimensional topography of the pattern.
(FR)Procédé consistant à mesurer une topographie tridimensionnelle d'une caractéristique d'un motif d'un dispositif de formation de motifs lithographiques et à calculer à partir des mesures des informations de phase de front d'onde liées à la topographie tridimensionnelle du motif.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)