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Machine translation
1. (WO2016090794) PHOTOCURING AND THERMOSETTING RESIN COMPOSITION, DRY FILM, CURED PRODUCT AND PRINTED CIRCUIT BOARD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/090794    International Application No.:    PCT/CN2015/076613
Publication Date: 16.06.2016 International Filing Date: 15.04.2015
IPC:
G03F 7/004 (2006.01), C08L 75/16 (2006.01), C08L 63/10 (2006.01)
Applicants: TAIYO INK (SUZHOU) CO., LTD. [CN/CN]; No.26 Taishan Road, Suzhou New District Suzhou, Jiangsu 215129 (CN)
Inventors: MAKITA, Shohei; (CN).
YAMAMOTO, Shuichi; (CN).
YAMADA, Shinichi; (CN).
MIWA, Takao; (CN)
Agent: LINDA LIU & PARTNERS; F16 Tower C Beijing Global Trade Center, 36 North Third Ring East Road, Dongcheng District Beijing 100013 (CN)
Priority Data:
201410756918.9 10.12.2014 CN
Title (EN) PHOTOCURING AND THERMOSETTING RESIN COMPOSITION, DRY FILM, CURED PRODUCT AND PRINTED CIRCUIT BOARD
(FR) COMPOSITION DE RÉSINE PHOTODURCISSABLE ET THERMODURCISSABLE, FILM SEC, PRODUIT DURCI ET CARTE DE CIRCUIT IMPRIMÉ
(ZH) 光固化性热固化性树脂组合物、干膜、固化物、及印刷电路板
Abstract: front page image
(EN)Disclosed are a photocuring and thermosetting resin composition containing (A) carboxylic resin, (B) a photopolymerization initiator, (C) a photosensitive monomer, (D) a thermosetting component and (E) a thermal base-generating agent, a dry film, a cured product, and a printed circuit board.
(FR)L'invention concerne une composition de résine photodurcissable et thermodurcissable contenant (A) une résine carboxylique, (B) un initiateur de photopolymérisation, (C) un monomère photosensible, (D) un composant thermodurcissable et (E) un agent générateur de base thermique, un film sec, un produit durci, et une carte de circuit imprimé.
(ZH)含有(A)含羧基树脂、(B)光聚合引发剂、(C)感光性单体、(D)热固化性成分、以及(E)热产碱剂的光固化性热固化性树脂组合物、干膜、固化物、及印刷电路板。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)