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1. (WO2016088836) BISPHENOL RESIN, ELECTRODE, LEAD STORAGE BATTERY, AND MANUFACTURING METHODS THEREFOR
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/088836    International Application No.:    PCT/JP2015/084024
Publication Date: 09.06.2016 International Filing Date: 03.12.2015
IPC:
C08G 14/073 (2006.01), H01M 4/62 (2006.01)
Applicants: HITACHI CHEMICAL COMPANY, LTD. [JP/JP]; 9-2, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1006606 (JP)
Inventors: UEDA Satoko; (JP).
YAMASHITA Takeshi; (JP).
HARA Kousuke; (JP).
KOGURE Kouji; (JP)
Agent: HASEGAWA Yoshiki; (JP)
Priority Data:
2014-247279 05.12.2014 JP
Title (EN) BISPHENOL RESIN, ELECTRODE, LEAD STORAGE BATTERY, AND MANUFACTURING METHODS THEREFOR
(FR) RÉSINE BISPHÉNOL, ÉLECTRODE, BATTERIE AU PLOMB, ET PROCÉDÉS DE FABRICATION CORRESPONDANTS
(JA) ビスフェノール系樹脂、電極、鉛蓄電池及びこれらの製造方法
Abstract: front page image
(EN)A bisphenol resin obtained by reacting bisphenol A, bisphenol S, at least one selected from a group consisting of aminobenzene sulfonic acid and aminobenzene sulfonic acid derivatives, and at least one selected from a group consisting of formaldehyde and formaldehyde derivatives.
(FR)L'invention concerne une résine bisphénol obtenue en faisant réagir du bisphénol A, du bisphénol B, au moins un composé choisi dans un groupe constitué d'acide sulfonique aminobenzène et de dérivés d'acide sulfonique aminobenzène, et au moins un composé choisi dans un groupe constitué de formaldéhyde et de dérivés de formaldéhyde.
(JA) ビスフェノールAと、ビスフェノールSと、アミノベンゼンスルホン酸及びアミノベンゼンスルホン酸誘導体からなる群より選ばれる少なくとも一種と、ホルムアルデヒド及びホルムアルデヒド誘導体からなる群より選ばれる少なくとも一種と、を反応させて得られる、ビスフェノール系樹脂。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)