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1. (WO2016088648) SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/088648    International Application No.:    PCT/JP2015/083264
Publication Date: 09.06.2016 International Filing Date: 26.11.2015
IPC:
C07C 309/12 (2006.01), C07C 381/12 (2006.01), C09K 3/00 (2006.01), G03F 7/004 (2006.01), H01L 21/027 (2006.01)
Applicants: TOYO GOSEI CO., LTD. [JP/JP]; 1603, Kamimyoden, Ichikawa-shi, Chiba 2720012 (JP)
Inventors: UTSUMI, Yoshiyuki; (JP).
KOBAYASHI, Noriaki; (JP).
KAMAKURA, Takahiro; (JP)
Agent: KURIHARA, Hiroyuki; (JP)
Priority Data:
2014-247414 05.12.2014 JP
Title (EN) SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD
(FR) DÉRIVÉ D'ACIDE SULFONIQUE, PHOTOGÉNÉRATEUR D'ACIDE COMPRENANT CE DÉRIVÉ, COMPOSITION DE PHOTORÉSINE, ET PROCÉDÉ DE FABRICATION DE DISPOSITIF
(JA) スルホン酸誘導体、それを用いた光酸発生剤、レジスト組成物及びデバイスの製造方法
Abstract: front page image
(EN)A sulfonic acid derivative represented by general formula (1). General formula (1): R1COOCH2CH2CFHCF2SO3-M+ (in said formula (1), R1 is a C1-200 monovalent organic group having at least one hydroxyl group, and may have a substituent other than said hydroxyl group. M+ is a counter cation.)
(FR)Dérivé d'acide sulfonique représenté par la formule générale (1). Formule générale (1): R1COOCH2CH2CFHCF2SO3 -M+. (Dans ladite formule (1), R1 représente un groupe organique monovalent en C1-C200 comprenant au moins un groupe hydroxyle, et pouvant comprendre un substituant autre que ledit groupe hydroxyle. M + représente un cation monovalent.)
(JA) 下記一般式(1)で表されるスルホン酸誘導体とする。 RCOOCHCHCFHCFSO (1) (前記式(1)において、Rは、少なくとも1つのヒドロキシル基を有し、且つ、該ヒドロキシル基以外の置換基を有していてもよい炭素数1~200の1価の有機基を示す。Mは対カチオンを示す。)
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)