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1. (WO2016065221) COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILMS
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2016/065221 International Application No.: PCT/US2015/057045
Publication Date: 28.04.2016 International Filing Date: 23.10.2015
IPC:
C23C 16/40 (2006.01) ,C23C 16/34 (2006.01) ,H01L 21/02 (2006.01) ,C23C 16/455 (2006.01)
Applicants: VERSUM MATERIALS US, LLC[US/US]; 8555 River Parkway Tempe, AZ 85284, US
Inventors: LEI, Xinjian; US
KIM, Moo-Sung; KR
MACDONALD, Matthew R.; US
XIAO, Manchao; US
Agent: ROSSI, Joseph D.; US
Priority Data:
62/068,24824.10.2014US
Title (EN) COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILMS
(FR) COMPOSITIONS ET PROCÉDÉS LES UTILISANT POUR LE DÉPÔT DE FILMS CONTENANT DU SILICIUM
Abstract: front page image
(EN) Described herein are compositions and methods using same for forming a silicon-containing film or material such as without limitation a silicon oxide, silicon nitride, silicon oxynitride, a carbon-doped silicon nitride, or a carbon-doped silicon oxide film in a semiconductor deposition process, such as without limitation, a plasma enhanced atomic layer deposition of silicon-containing film.
(FR) L'invention concerne des compositions et des procédés de leur utilisation pour former un matériau ou un film contenant du silicium tel que, de façon non limitative, oxyde de silicium, nitrure de silicium, oxynitrure de silicium, nitrure de silicium dopé au carbone, ou un film d'oxyde de silicium dopé au carbone dans un procédé de dépôt de semi-conducteur, de telle sorte que, de façon non limitative, un dépôt de couche atomique amélioré par plasma de film contenant du silicium.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)