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1. (WO2016065219) COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/065219    International Application No.:    PCT/US2015/057040
Publication Date: 28.04.2016 International Filing Date: 23.10.2015
IPC:
C23C 16/40 (2006.01), C23C 16/34 (2006.01), H01L 21/02 (2006.01)
Applicants: VERSUM MATERIALS US, LLC [US/US]; 8555 River Parkway Tempe, AZ 85284 (US)
Inventors: LI, Jianheng; (US).
LEHMANN, John, Francis; (US).
LEI, Xinjian; (US).
VRTIS, Raymond, Nicholas; (US).
RIDGEWAY, Robert, Gordon; (US).
ENTLEY, William, Robert; (US)
Agent: ROSSI, Joseph D.; (US)
Priority Data:
62/068,248 24.10.2014 US
Title (EN) COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM
(FR) COMPOSITIONS ET PROCÉDÉS LES UTILISANT POUR LE DÉPÔT D'UN FILM CONTENANT DU SILICIUM
Abstract: front page image
(EN)Described herein are compositions and methods using same for forming a silicon-containing film such as without limitation a silicon oxide, silicon nitride, silicon oxynitride, a carbon-doped silicon nitride, or a carbon-doped silicon oxide film on at least a surface of a substrate having a surface feature. In one aspect, the composition comprises at least one compound is selected from the group consisting of a siloxane, an trisilylamine-based compound, an organoaminodisilane compound, and a cyclic trisilazane compound.
(FR)Cette invention concerne des compositions et des procédés d'utilisation de ceux-ci pour former un film contenant du silicium, tel qu'un film d'oxyde de silicium, de nitrure de silicium, d'oxynitrure de silicium, de nitrure de silicium dopé au carbone ou d'oxyde de silicium dopé au carbone, sans limitation, sur au moins une surface d'un substrat doté d'un motif de surface. Selon un aspect de l'invention, ladite composition comprend au moins un composé est choisi dans le groupe constitué par un siloxane, un composé à base de trisilylamine, un composé organoaminodisilane, et un composé trisilazane cyclique.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)