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1. (WO2016063409) EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2016/063409 International Application No.: PCT/JP2014/078325
Publication Date: 28.04.2016 International Filing Date: 24.10.2014
IPC:
H05G 2/00 (2006.01) ,H01L 21/027 (2006.01) ,H01S 3/00 (2006.01) ,H05H 1/24 (2006.01)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
G
X-RAY TECHNIQUE
2
Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
S
DEVICES USING STIMULATED EMISSION
3
Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
Applicants:
ギガフォトン株式会社 GIGAPHOTON INC. [JP/JP]; 栃木県小山市大字横倉新田400番地 400, Oaza Yokokurashinden, Oyama-shi, Tochigi 3238558, JP
Inventors:
植野 能史 UENO, Yoshifumi; JP
細田 裕計 HOSODA, Hirokazu; JP
藪 隆之 YABU, Takayuki; JP
Agent:
特許業務法人藤央特許事務所 TOU-OU PATENT FIRM; 東京都港区虎ノ門一丁目16番4号アーバン虎ノ門ビル Urban Toranomon Bldg., 16-4, Toranomon 1-chome, Minato-ku, Tokyo 1050001, JP
Priority Data:
Title (EN) EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT
(FR) SYSTÈME DE GÉNÉRATION DE LUMIÈRE ULTRAVIOLETTE EXTRÊME ET PROCÉDÉ DE GÉNÉRATION DE LUMIÈRE ULTRAVIOLETTE EXTRÊME
(JA) 極端紫外光生成システム及び極端紫外光を生成する方法
Abstract:
(EN) This extreme ultraviolet light generation system may include a laser system and a control unit. The laser system may generate a mist target by irradiating a first target with first pulsed laser light and diffusing the first target, and may irradiate the mist target with second pulsed laser light. The control unit may measure the first mist diameter of the mist target, and on the basis of the first mist diameter, may control irradiation timing of the second pulsed laser light and/or energy of the first pulsed laser with which a second target is to be irradiated.
(FR) L'invention porte sur un système de génération de lumière ultraviolette extrême qui peut comprendre un système laser et une unité de commande. Le système laser peut générer une cible de brouillard par exposition d'une première cible à une première lumière laser pulsée et diffusion de la première cible, et peut exposer la cible de brouillard à une seconde lumière laser pulsée. L'unité de commande peut mesurer le premier diamètre de brouillard de la cible de brouillard, et sur la base du premier diamètre de brouillard, peut commander le positionnement temporel d'émission de la seconde lumière laser pulsée et/ou l'énergie du premier laser pulsé avec lesquels une seconde cible doit être exposée.
(JA)  極端紫外光生成システムは、レーザシステム及び制御部を含んでもよい。レーザシステムは、第1ターゲットに第1パルスレーザ光を照射して前記第1ターゲットを拡散させてミストターゲットを生成し、ミストターゲットに第2パルスレーザ光を照射してもよい。制御部は、ミストターゲットの第1ミスト径を計測し、第1ミスト径に基づいて、第2パルスレーザ光の照射タイミング及び第2ターゲットに照射する第1パルスレーザ光のエネルギの少なくとも一方を制御してもよい。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)