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1. (WO2016062540) SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, METHOD OF LOADING A SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2016/062540 International Application No.: PCT/EP2015/073112
Publication Date: 28.04.2016 International Filing Date: 07.10.2015
IPC:
G03F 7/20 (2006.01) ,F16C 32/06 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
C
SHAFTS; FLEXIBLE SHAFTS; MECHANICAL MEANS FOR TRANSMITTING MOVEMENT IN A FLEXIBLE SHEATHING; ELEMENTS OF CRANKSHAFT MECHANISMS; PIVOTS; PIVOTAL CONNECTIONS; ROTARY ENGINEERING ELEMENTS OTHER THAN GEARING, COUPLING, CLUTCH OR BRAKE ELEMENTS; BEARINGS
32
Bearings not otherwise provided for
06
with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
TROMP, Siegfried, Alexander; NL
VERWEIJ, Antonie, Hendrik; NL
SOETHOUDT, Abraham, Alexander; NL
VAN DE POEL, Jan, Pieter; NL
BAGGEN, Mark, Constant, Johannes; NL
Agent:
DUNG, S.; NL
Priority Data:
14190079.523.10.2014EP
Title (EN) SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, METHOD OF LOADING A SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
(FR) TABLE SUPPORT POUR APPAREIL LITHOGRAPHIQUE, PROCÉDÉ DE CHARGEMENT D'UN SUBSTRAT, APPAREIL LITHOGRAPHIQUE ET PROCÉDÉ DE FABRICATION DE DISPOSITIF
Abstract:
(EN) There are disclosed a support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table (100) is configured to support a substrate (W). The support table comprises a base surface (101). The base surface faces a bottom surface (103) of the substrate when the substrate is supported by the support table. One or more gas cushion members (102) are provided above the base surface. Each of the gas cushion members comprises a recess (108). The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localised build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.
(FR) L'invention concerne une table support destinée à un appareil lithographique, un procédé de chargement d'un substrat, un appareil lithographique et un procédé de fabrication d'un dispositif utilisant un appareil lithographique. Dans une configuration, une table support (100) sert à porter un substrat (W). Cette table support comprend une surface de base (101). La surface de base se trouve en regard d'une surface inférieure (103) du substrat lorsque ce dernier est porté par la table support. Un ou plusieurs éléments à coussin de gaz (102) sont situés au-dessus de la surface de base. Chacun des éléments à coussin de gaz comporte un évidement (108). L'évidement est conçu et formé de telle sorte qu'un abaissement du substrat à un endroit sur la table support où le substrat est porté par ladite table provoque une accumulation localisée de la pression à l'intérieur de l'évidement. L'accumulation localisée de la pression produit un effet d'amortissement au gaz localisé pendant l'abaissement du substrat.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)