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1. (WO2016061468) HIGH-SPEED DEPOSITION OF MIXED OXIDE BARRIER FILMS

Pub. No.:    WO/2016/061468    International Application No.:    PCT/US2015/055961
Publication Date: Fri Apr 22 01:59:59 CEST 2016 International Filing Date: Sat Oct 17 01:59:59 CEST 2015
IPC: H01L 21/205
Applicants: LOTUS APPLIED TECHNOLOGY, LLC
Inventors: DICKEY, Eric R.
DANFORTH, Bryan Larson
Title: HIGH-SPEED DEPOSITION OF MIXED OXIDE BARRIER FILMS
Abstract:
The present disclosure relates to metal oxide barrier films and particularly to high-speed methods for depositing such barrier films. Methods are disclosed that are capable of producing barrier films with water vapor transmission rates (WVTR) below 0.1 g/(m2•day). Methods are disclosed for continuously transporting a substrate within an atomic layer deposition (ALD) reactor and performing a limited number of ALD cycles to achieve a desired WVTR.