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1. (WO2016061345) A MULTISPECTRAL AND POLARIZATION-SELECTIVE DETECTOR
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2016/061345 International Application No.: PCT/US2015/055728
Publication Date: 21.04.2016 International Filing Date: 15.10.2015
IPC:
H01L 31/0352 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
0248
characterised by their semiconductor bodies
0352
characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
Applicants:
ZENA TECHNOLOGIES, INC. [US/US]; P.O. Box 380288 Cambridge, Massachusetts 02238-0288, US
Inventors:
WOBER, Munib; US
Agent:
GU, Qian; US
Priority Data:
14/516,16216.10.2014US
Title (EN) A MULTISPECTRAL AND POLARIZATION-SELECTIVE DETECTOR
(FR) DÉTECTEUR MULTISPECTRAL ET SÉLECTIF EN POLARISATION
Abstract:
(EN) Described herein are devices operable to detect various portions of radiation incident on a receiving area of the device, systems incorporating the same, methods of using and methods of manufacturing thereof. Such a device comprises a substrate; at least one first feature; and at least one second feature, both extending substantially perpendicularly from the substrate. The at least one first feature and the at least second feature are operable to selectively absorb various portions of the radiation defined by their respective ranges of wavelengths and linear polarization. The at least one first feature and the at least one second feature are positioned on the substrate such that at least 50% of the first portion and at least 50% of the second portion of the radiation incident on the receiving area is selectively absorbed by the at least one first feature and the at least one second feature, respectively.
(FR) L'invention concerne des dispositifs servant à détecter diverses parties d'un rayonnement incident sur une zone de réception du dispositif, des systèmes les comprenant, leurs procédés d'utilisation et leurs procédés de fabrication. Un tel dispositif comprend un substrat; au moins un premier élément; et au moins un second élément, les deux s'étendant sensiblement perpendiculairement à partir du substrat. Ledit premier élément et ledit second élément servent à absorber sélectivement diverses parties du rayonnement définies par leurs plages respectives de longueurs d'onde et de polarisation linéaire. Ledit premier élément et ledit second élément sont positionnés sur le substrat de manière qu'au moins 50 % de la première partie et au moins 50 % de la seconde partie du rayonnement incident sur la zone de réception soient sélectivement absorbées par ledit premier élément et ledit second élément, respectivement.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)