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1. (WO2016059843) QUANTUM DOT PROTECTIVE FILM, QUANTUM DOT FILM USING SAME, AND BACKLIGHT UNIT
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2016/059843 International Application No.: PCT/JP2015/070419
Publication Date: 21.04.2016 International Filing Date: 16.07.2015
IPC:
F21S 2/00 (2006.01) ,B32B 9/00 (2006.01) ,B32B 27/36 (2006.01) ,F21Y 101/02 (2006.01)
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
21
LIGHTING
S
NON-PORTABLE LIGHTING DEVICES OR SYSTEMS THEREOF
2
Systems of lighting devices, not provided for in main groups F21S4/-F21S10/119
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9
Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27
Layered products essentially comprising synthetic resin
36
comprising polyesters
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
21
LIGHTING
Y
INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21L, F21S and F21V104
101
Point-like light sources
02
Miniature, e.g. light emitting diodes (LED)
Applicants:
凸版印刷株式会社 TOPPAN PRINTING CO., LTD. [JP/JP]; 東京都台東区台東一丁目5番1号 5-1, Taito 1-chome, Taito-ku, Tokyo 1100016, JP
Inventors:
北原 吏里 KITAHARA Tsukasa; JP
時野谷 修 TOKINOYA Osamu; JP
西川 健 NISHIKAWA Ken; JP
Agent:
長谷川 芳樹 HASEGAWA Yoshiki; JP
Priority Data:
2014-21185716.10.2014JP
Title (EN) QUANTUM DOT PROTECTIVE FILM, QUANTUM DOT FILM USING SAME, AND BACKLIGHT UNIT
(FR) FILM DE PROTECTION DE POINTS QUANTIQUES, FILM DE POINTS QUANTIQUES L'UTILISANT, ET UNITÉ DE RÉTROÉCLAIRAGE
(JA) 量子ドット保護フィルム、それを用いた量子ドットフィルム及びバックライトユニット
Abstract:
(EN) A first quantum dot protective film is provided with: a first barrier film containing a silica deposition layer; and a first diffusion layer. The silica deposition layer has an O/Si atomic ratio of from 1.7 to 2.0 (inclusive), while having a refractive index of from 1.5 to 1.7 (inclusive). The first quantum dot protective film has a reflectance of from 10% to 20% (inclusive) and a transmittance of from 80% to 95% (inclusive) at all of the wavelength of 450 nm, the wavelength of 540 nm and the wavelength of 620 nm.
(FR) L'invention concerne un premier film de protection de points quantiques qui est pourvu : d'un premier film barrière contenant une couche de dépôt de silice ; et d'une première couche de diffusion. La couche de dépôt de silice présente un rapport atomique O/Si allant de 1,7 à 2,0 (inclus), tout en présentant un indice de réfraction allant de 1,5 à 1,7 (inclus). Le premier film de protection de points quantiques présente un coefficient de réflexion allant de 10 % à 20 % (inclus) et un coefficient de transmission allant de 80 % à 95 % (inclus) à toutes les longueurs d'onde parmi une longueur d'onde de 450 nm, une longueur d'onde de 540 nm et une longueur d'onde de 620 nm.
(JA) 第1量子ドット保護フィルムは、シリカ蒸着層を含む第1バリアフィルムと、第1拡散層とを備える。シリカ蒸着層のO/Si比が原子比で1.7以上2.0以下であり、シリカ蒸着層の屈折率が1.5以上1.7以下であり、波長450nm、波長540nm及び波長620nmの全ての波長での第1量子ドット保護フィルムの反射率が10%以上20%以下であり、透過率が80%以上95%以下である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)