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1. (WO2016057801) PRECISE CRITICAL DIMENSION CONTROL USING BILAYER ALD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/057801    International Application No.:    PCT/US2015/054709
Publication Date: 14.04.2016 International Filing Date: 08.10.2015
IPC:
H01L 21/205 (2006.01)
Applicants: APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, California 95054 (US)
Inventors: TAKESHITA, Kenji; (US).
SAKAMOTO, Nobuhiro; (JP).
TAKENAGA, Yoshihiro; (JP).
XIA, Li-Qun; (US).
SRIRAM, Mandyam; (US)
Agent: BLANKMAN, Jeffrey I.; (US)
Priority Data:
62/061,677 08.10.2014 US
14/878,576 08.10.2015 US
Title (EN) PRECISE CRITICAL DIMENSION CONTROL USING BILAYER ALD
(FR) CONTRÔLE PRÉCIS DE LA DIMENSION CRITIQUE À L'AIDE D'UN PROCESSUS DE DÉPÔT DE COUCHE ATOMIQUE (ALD) BICOUCHE
Abstract: front page image
(EN)Methods for self-aligned multiple patterning including controlled slimming of features during spacer layer deposition. Multiple spacer layer deposition process conditions produce a balance between controlling the damage to the features and increasing production throughput.
(FR)La présente invention concerne des procédés de formation de motifs auto-alignés multiples comprenant une diminution contrôlée des détails pendant le dépôt de couches d'espacement. Plusieurs conditions du processus de dépôt de couches d'espacement produisent un équilibre entre le contrôle de l'endommagement des détails et l'augmentation de la capacité de production.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)