Search International and National Patent Collections

1. (WO2016057801) PRECISE CRITICAL DIMENSION CONTROL USING BILAYER ALD

Pub. No.:    WO/2016/057801    International Application No.:    PCT/US2015/054709
Publication Date: Fri Apr 15 01:59:59 CEST 2016 International Filing Date: Fri Oct 09 01:59:59 CEST 2015
IPC: H01L 21/205
Applicants: APPLIED MATERIALS, INC.
Inventors: TAKESHITA, Kenji
SAKAMOTO, Nobuhiro
TAKENAGA, Yoshihiro
XIA, Li-Qun
SRIRAM, Mandyam
Title: PRECISE CRITICAL DIMENSION CONTROL USING BILAYER ALD
Abstract:
Methods for self-aligned multiple patterning including controlled slimming of features during spacer layer deposition. Multiple spacer layer deposition process conditions produce a balance between controlling the damage to the features and increasing production throughput.