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Machine translation
1. (WO2016056748) SUBSTRATE PROCESSING HEATER DEVICE AND SUBSTRATE SOLUTION PROCESSING DEVICE HAVING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/056748    International Application No.:    PCT/KR2015/009051
Publication Date: 14.04.2016 International Filing Date: 28.08.2015
IPC:
H01L 21/32 (2006.01), H01L 21/02 (2006.01), H01L 21/683 (2006.01)
Applicants: ZEUS CO., LTD. [KR/KR]; (busan-dong) 161-6, Gyeonggidong-ro Osan-si Gyeonggi-do 18148 (KR)
Inventors: JUNG, Kwang Il; (KR).
LEE, Byeong Su; (KR).
RYU, Joo Hyung; (KR)
Agent: B&IP-JOOWON PATENT AND LAW FIRM; (Nonhyeon-dong)9th Floor, Construction Center Eonju-ro 711 Gangnam-gu Seoul 06050 (KR)
Priority Data:
10-2014-0136938 10.10.2014 KR
10-2014-0136939 10.10.2014 KR
Title (EN) SUBSTRATE PROCESSING HEATER DEVICE AND SUBSTRATE SOLUTION PROCESSING DEVICE HAVING SAME
(FR) DISPOSITIF DE CHAUFFAGE POUR TRAITEMENT DE SUBSTRAT ET DISPOSITIF DE TRAITEMENT PAR SOLUTION DE SUBSTRAT LE COMPRENANT
(KO) 기판 처리용 히터장치 및 이를 구비한 기판 액처리 장치
Abstract: front page image
(EN)The present invention relates to a substrate processing heater device for heating a substrate so as to process the substrate, and a substrate solution processing device having the same, comprising: a heater part formed to have an opposite surface of a size greater than or equal to a processing surface size of a substrate, thereby heating the substrate; and a lamp part having a plurality of lamp units arranged to be adjacent to each other on the opposite surface of the heater part. Therefore, the present invention enables an opposite surface of a heater part to be formed of a size greater than or equal to a processing surface size of a substrate and a plurality of lamp units to be arranged adjacently to each other on the opposite surface, thereby providing an effect of preventing non-uniform processing for a processing surface of a substrate by uniformly maintaining a heating temperature on the processing surface of the substrate, such that the processing efficiency of the substrate can be improved.
(FR)La présente invention porte sur un dispositif de chauffage pour traitement de substrat destiné à chauffer un substrat de manière à traiter le substrat, et sur un dispositif de traitement par solution de substrat le comprenant, lequel dispositif de chauffage comprend : une partie chauffante formée pour avoir une surface en regard d'une taille supérieure ou égale à une taille de surface de traitement d'un substrat, ce qui permet de chauffer le substrat; et une partie lampes comportant une pluralité d'unités de lampe disposées de manière à être adjacentes les unes aux autres sur la surface en regard de la partie chauffante. Par conséquent, la présente invention permet de former une surface en regard d'une partie chauffante en une taille supérieure ou égale à une taille de surface de traitement d'un substrat et de disposer une pluralité d'unités de lampe de manière adjacente les unes aux autres sur la surface en regard, ce qui permet d'obtenir un effet de prévention de traitement non uniforme pour une surface de traitement d'un substrat par maintien d'une température de chauffage uniforme sur la surface de traitement du substrat, de manière à pouvoir améliorer l'efficacité de traitement du substrat.
(KO)본 발명은 기판을 처리하기 위해 기판을 가열하는 기판 처리용 히터장치 및 이를 구비한 기판 액처리 장치에 관한 것으로서, 기판의 처리면 크기 이상의 대향면을 갖도록 형성되어 기판을 가열하는 히터부와, 이 히터부의 대향면에 서로 인접하게 배치되는 복수의 램프유닛을 구비한 램프부를 포함하는 것을 특징으로 한다. 따라서, 본 발명은 히터부의 대향면을 기판의 처리면 크기 이상으로 형성하고 대향면에 복수개의 램프유닛을 서로 인접하게 배치함으로써, 기판의 처리면 상에 가열온도를 균일하게 유지하여 기판 처리면에 대한 불균일한 처리를 방지하여 기판의 처리효율을 향상시킬 수 있는 효과를 제공한다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)