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1. (WO2016056355) NAPHTHOL TYPE CALIXARENE COMPOUND, METHOD FOR PRODUCING SAME, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL AND COATING FILM
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2016/056355 International Application No.: PCT/JP2015/076096
Publication Date: 14.04.2016 International Filing Date: 15.09.2015
IPC:
C07C 39/17 (2006.01) ,C07C 37/20 (2006.01) ,G03F 7/023 (2006.01) ,C07B 61/00 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
39
Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
12
polycyclic with no unsaturation outside the aromatic rings
17
containing other rings in addition to the six-membered aromatic rings
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
37
Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring
11
by reactions increasing the number of carbon atoms
20
using aldehydes or ketones
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
022
Quinonediazides
023
Macromolecular quinonediazides; Macromolecular additives, e.g. binders
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
B
GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
61
Other general methods
Applicants: DIC CORPORATION[JP/JP]; 35-58, Sakashita 3-chome, Itabashi-ku, Tokyo 1748520, JP
Inventors: IMADA Tomoyuki; JP
Agent: KONO Michihiro; JP
Priority Data:
2014-20926510.10.2014JP
Title (EN) NAPHTHOL TYPE CALIXARENE COMPOUND, METHOD FOR PRODUCING SAME, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL AND COATING FILM
(FR) COMPOSÉ CALIXARÈNE DE TYPE NAPHTOL, PROCÉDÉ POUR SA PRODUCTION, COMPOSITION PHOTOSENSIBLE, MATÉRIAU DE RÉSERVE ET FILM DE REVÊTEMENT
(JA) ナフトール型カリックスアレーン化合物及びその製造方法、感光性組成物、レジスト材料、並びに塗膜
Abstract:
(EN) Provided are: a naphthol type calixarene compound having excellent solubility in solvents; a method for producing the naphthol type calixarene compound; a photosensitive composition which contains the naphthol type calixarene compound and is capable of providing a coating film that has excellent thermal decomposition resistance, alkali developability, optical sensitivity and resolution; a resist material which is formed from the photosensitive composition; and a coating film. Specifically provided is a naphthol type calixarene compound which is characterized by having a molecular structure represented by general formula (1). (In formula (1), each R1 represents a hydrogen atom, an alkyl group, an alkoxy group, an optionally substituted aryl group, an optionally substituted aralkyl group or a halogen atom, and the plurality of R1 moieties may be the same as or different from each other; each R2 represents an optionally substituted alkyl group or an optionally substituted aryl group; and n represents an integer of 2-10.)
(FR) L'invention concerne un composé calixarène de type naphtol ayant une excellente solubilité dans les solvants ; un procédé de production du composé calixarène de type naphtol ; une composition photosensible qui contient le composé calixarène de type naphtol et qui est capable de réaliser un film de revêtement ayant une excellente résistance à la décomposition thermique, une excellente aptitude au développement alcalin, une excellente sensibilité optique et une excellente résolution ; un matériau de réserve qui est formé à partir de la composition photosensible ; et un film de revêtement. L'invention concerne spécifiquement un composé calixarène de type naphtol, qui est caractérisé en ce qu'il a une structure moléculaire représentée par la formule générale (1). (Dans la formule (1), chaque R1 représente un atome d'hydrogène, un groupe alkyle, un groupe alcoxy, un groupe aryle en option substitué, un groupe aralkyle en option substitué ou un atome d'halogène, et la pluralité des fragments R1 peuvent être identiques les uns aux autres ou différents les uns des autres ; chaque R2 représente un groupe alkyle en option substitué ou un groupe aryle en option substitué, et n représente un entier de 2 à 10.)
(JA)  溶剤溶解性に優れるナフトール型カリックスアレーン化合物と、当該ナフトール型カリックスアレーン化合物の製造方法と、当該ナフトール型カリックスアレーン化合物を含有し、耐熱分解性、アルカリ現像性、光感度、解像度に優れる塗膜が得られる感光性組成物と、当該感光性組成物からなるレジスト材料及び塗膜を提供する。具体的には一般式(1)で表される分子構造からなることを特徴とする、ナフトール型カリックスアレーン化合物[式(1)中、Rは、水素原子、アルキル基、アルコキシ基、置換基を有していてもよいアリール基、置換基を有していてもよいアラルキル基、又はハロゲン原子を表し、複数存在するRは、互いに同一でもよく異なっていてもよく、Rは置換基を有していてもよいアルキル基又は置換基を有していてもよいアリール基を表し、nは2~10の整数を表す。]。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)