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1. (WO2016056340) METHOD FOR PRODUCING POLYAMIDE RESIN
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/056340    International Application No.:    PCT/JP2015/075502
Publication Date: 14.04.2016 International Filing Date: 08.09.2015
IPC:
C08G 69/28 (2006.01)
Applicants: MITSUBISHI GAS CHEMICAL COMPANY, INC. [JP/JP]; 5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo 1008324 (JP)
Inventors: TOCHIHARA, Tatsuya; (JP).
SHINOHARA, Katsumi; (JP).
MITADERA, Jun; (JP)
Agent: OHTANI, Tamotsu; (JP)
Priority Data:
2014-206591 07.10.2014 JP
Title (EN) METHOD FOR PRODUCING POLYAMIDE RESIN
(FR) PROCÉDÉ DE PRODUCTION D'UNE RÉSINE DE POLYAMIDE
(JA) ポリアミド樹脂の製造方法
Abstract: front page image
(EN)Provided is a method for producing a polyamide resin, which includes a step of reacting a dicarboxylic acid component that contains 50 mol.% or more of sebacic acid with a diamine component that contains 70 mol.% or more of xylylene diamine, wherein the total content of specific compounds in the sebacic acid is 100 ppm by mass or less.
(FR)L'invention concerne un procédé de production d'une résine de polyamide, qui comprend une étape consistant à faire réagir un composant acide dicarboxylique qui contient 50% mol ou plus d'acide sébacique avec un composant diamine qui contient 70% mol ou plus de xylylène diamine, la teneur totale en composés spécifiques de l'acide sébacique étant égale ou inférieure à 100 ppm en masse.
(JA) セバシン酸を50モル%以上含むジカルボン酸成分と、キシリレンジアミンを70モル%以上含むジアミン成分とを反応させる工程を含むポリアミド樹脂の製造方法であって、前記セバシン酸中における特定の化合物の合計含有量が100質量ppm以下である、ポリアミド樹脂の製造方法。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)