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1. (WO2016055330) EUV LITHOGRAPHY SYSTEM AND OPERATING METHOD

Pub. No.:    WO/2016/055330    International Application No.:    PCT/EP2015/072600
Publication Date: Fri Apr 15 01:59:59 CEST 2016 International Filing Date: Thu Oct 01 01:59:59 CEST 2015
IPC: G03F 7/20
Applicants: CARL ZEISS SMT GMBH
ASML NETHERLANDS B.V.
Inventors: EHM, Dirk Heinrich
SCHMIDT, Stefan-Wolfgang
OSORIO, Edgar
TE SLIGTE, Edwin
ZELLENRATH, Mark
LOGTENBERG, Hella
Title: EUV LITHOGRAPHY SYSTEM AND OPERATING METHOD
Abstract:
The invention relates to an EUV lithography system (1) comprising: at least one optical element (13, 14) having an optical surface (13a, 14a) arranged in a vacuum environment (17) of the EUV lithography system (1); and a supply device (27) for supplying hydrogen into the vacuum environment (17), in which at least one surface (29a) containing silicon is arranged. The supply device (27) is designed to also supply a gas containing oxygen into the vacuum environment (17), and has a dosing device (28) for setting an oxygen partial pressure (P02) at the at least one surface (29a) containing silicon and/or at the optical surface (13a, 14a).