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1. (WO2016053587) MICROELECTROMECHANICAL SYSTEMS (MEMS) PRESSURE SENSOR HAVING A LEAKAGE PATH TO A CAVITY
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2016/053587 International Application No.: PCT/US2015/049209
Publication Date: 07.04.2016 International Filing Date: 09.09.2015
IPC:
G01L 9/12 (2006.01) ,G01L 27/00 (2006.01)
Applicants: INVENSENSE, INC.[US/US]; 1745 Technology Drive San Jose, California 95110, US
Inventors: TSAI, Julius Ming-Lin; US
KHENKIN, Aleksey S.; US
CAGDASER, Baris; US
SALVIA, James Christian; US
ASSADERAGHI, Fariborz; US
Agent: JOSHI, Vinay; US
Priority Data:
14/500,85429.09.2014US
Title (EN) MICROELECTROMECHANICAL SYSTEMS (MEMS) PRESSURE SENSOR HAVING A LEAKAGE PATH TO A CAVITY
(FR) CAPTEUR DE PRESSION DE SYSTÈMES MICROÉLECTROMÉCANIQUES (MEMS) POSSÉDANT UN CHEMIN DE FUITE VERS UNE CAVITÉ
Abstract: front page image
(EN) Microelectromechanical systems (MEMS) pressure sensors having a leakage path are described. Provided implementations can comprise a MEMS pressure sensor system associated with a back cavity and a membrane that separates the back cavity and an ambient atmosphere. A pressure of the ambient atmosphere is determined based on a parameter associated with movement of the membrane.
(FR) L'invention concerne des capteurs de pression de systèmes micro-électromécaniques (MEMS) présentant un chemin de fuite. Les modes de réalisation peuvent comprendre un système de capteurs de pression MEMS associé à une cavité arrière et une membrane qui sépare la cavité arrière de l'atmosphère ambiante. Une pression de l'atmosphère ambiante est déterminée en se basant sur un paramètre associé au mouvement de la membrane.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)