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1. (WO2016053191) FORMULATION AND METHOD FOR INHIBITING CARBON-BASED DEPOSITS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2016/053191    International Application No.:    PCT/SG2015/050359
Publication Date: 07.04.2016 International Filing Date: 30.09.2015
Chapter 2 Demand Filed:    29.07.2016    
IPC:
B08B 3/08 (2006.01), C23C 22/05 (2006.01), C23F 1/28 (2006.01), C23F 15/00 (2006.01), C23G 1/08 (2006.01), C09K 13/06 (2006.01)
Applicants: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH [SG/SG]; 1 Fusionopolis Way, #20-10 Connexis North Tower, Singapore 138632 (SG)
Inventors: HONG, Liang; (SG).
ZHENG, Yuanhuan; (SG).
TAY, Siok Wei; (SG)
Agent: SPRUSON & FERGUSON (ASIA) PTE LTD; P.O. Box 1531, Robinson Road Post Office Singapore 903031 (SG)
Priority Data:
10201406232P 30.09.2014 SG
Title (EN) FORMULATION AND METHOD FOR INHIBITING CARBON-BASED DEPOSITS
(FR) FORMULATION ET PROCÉDÉ D'INHIBITION DE DÉPÔTS CARBONÉS
Abstract: front page image
(EN)There is a formulation and a method for inhibiting carbon-based deposits on metal substrate. The method comprises the use of a formulation comprising at least one oxidizing agent and at least one etchant capable of forming free metal ions from the metal substrate, at least one sequestering agent having a ligand capable of forming a complex with the free metal ions and at least one chelating agent having a ligand capable of complexing with at least one surface metal atom.
(FR)L'invention concerne une formulation et un procédé permettant d'inhiber les dépôts carbonés sur un substrat métallique. Le procédé fait appel à l'utilisation d'une formulation comprenant au moins un agent oxydant et au moins un agent d'attaque chimique pouvant former des ions métalliques libres à partir du substrat métallique, au moins un agent séquestrant contenant un ligand susceptible de former un complexe avec les ions métalliques libres et au moins un agent chélatant contenant un ligand susceptible de se complexer avec au moins un atome métallique superficiel.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)