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1. (WO2016052808) SEMICONDUCTOR PLASMA CLEANING APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2016/052808 International Application No.: PCT/KR2014/011683
Publication Date: 07.04.2016 International Filing Date: 02.12.2014
IPC:
H01L 21/302 (2006.01) ,H05H 1/46 (2006.01) ,H01L 21/677 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302
to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
46
using applied electromagnetic fields, e.g. high frequency or microwave energy
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677
for conveying, e.g. between different work stations
Applicants:
비전세미콘 주식회사 VISION SEMICON CO., LTD [KR/KR]; 대전시 유성구 테크노2로 265 265, Techno 2-ro Yuseong-gu Daejeon 305-510, KR
Inventors:
윤통섭 YOON, Tong Seob; KR
Agent:
박문수 PARK, Moon Su; KR
Priority Data:
10-2014-013228601.10.2014KR
Title (EN) SEMICONDUCTOR PLASMA CLEANING APPARATUS
(FR) APPAREIL DE NETTOYAGE PAR PLASMA DE SEMI-CONDUCTEURS
(KO) 반도체용 플라즈마 세정장치
Abstract:
(EN) The present invention relates to a plasma cleaning apparatus for cleaning semiconductor components through plasma discharge during a semiconductor manufacturing process and, more specifically, to a semiconductor plasma cleaning apparatus for performing, in the same magazine at one place, loading of semiconductor components, which are to be cleaned, accommodated within a magazine through a rotary stage, and unloading of the cleaned semiconductor components. The present invention comprises: a magazine table (100) for lifting a magazine (M), in which a plurality of semiconductor components (A) are loaded at predetermined intervals, in steps according to a cleaning progress state; a rotary stage (200) provided at the rear of the magazine table so as to rotate in the horizontal direction; a plasma cleaning chamber (300) descending to the rotary stage so as to clean the semiconductor components supplied to the rotary stage; a first transfer member (400) located at the front of the magazine table so as to push and move, in the backward direction whenever the magazine rises in steps, the semiconductor components, which are to be cleaned, loaded inside the magazine; and a second transfer member (500) provided to rise at the upper part of the rotary stage and to move in the forward and backward directions such that the semiconductor components, which are to be cleaned, moved in the backward direction through the first transfer member are picked up, thereby supplying the semiconductor components to the rotary stage or loading the semiconductor components in the magazine, in steps, by pushing, to the magazine table, the cleaned semiconductor components located at the upper part of the rotary stage.
(FR) La présente invention porte sur un appareil de nettoyage par plasma destiné à nettoyer des composants à semi-conducteurs par décharge plasma au cours d'un processus de fabrication de semi-conducteurs, et plus spécifiquement sur un appareil de nettoyage par plasma de semi-conducteurs destiné à effectuer, dans le même magasin à un seul endroit, un chargement de composants à semi-conducteurs qui doivent être nettoyés, logés à l'intérieur d'un magasin par l'intermédiaire d'un plateau rotatif, et un déchargement des composants à semi-conducteurs nettoyés. La présente invention comprend : une table de magasin (100) pour lever un magasin (M), dans lequel une pluralité de composants à semi-conducteurs (A) sont chargés à intervalles prédéfinis, par échelons en fonction d'un état de progression de nettoyage; un plateau rotatif (200) disposé à l'arrière de la table de magasin de manière à tourner dans la direction horizontale; une chambre de nettoyage par plasma (300) descendant jusqu'au plateau rotatif de manière à nettoyer les composants à semi-conducteurs fournis au plateau rotatif; un premier élément de transfert (400) situé à l'avant de la table de magasin de manière à pousser et à déplacer dans le sens vers l'arrière, chaque fois que le magasin s'élève par échelons, les composants à semi-conducteurs qui doivent être nettoyés, chargés à l'intérieur du magasin; et un second élément de transfert (500) disposé pour monter au niveau de la partie supérieure du plateau rotatif et pour se déplacer dans les sens vers l'avant et vers l'arrière de manière que les composants à semi-conducteurs qui doivent être nettoyés, déplacés dans le sens vers l'arrière par le premier élément de transfert, soient prélevés, ce qui permet de fournir les composants à semi-conducteurs au plateau rotatif ou de charger les composants à semi-conducteurs dans le magasin, par échelons, par poussée, vers la table de magasin, des composants à semi-conducteurs nettoyés situés au niveau de la partie supérieure du plateau rotatif.
(KO) 본 발명은 반도체 제조 공정중 플라즈마 방전을 통해 반도체부품을 세척하기 위한 플라즈마 세정장치에 관한 것으로서, 보다 상세하는 로터리스테이지를 통해 메거진 내에 수납된 세정대상이 되는 반도체부품의 로딩과 세정이 완료된 반도체부품의 언로딩이 단일의 장소에서 동일한 메거진에 대하여 이루어지도록 한 반도체용 플라즈마 세정장치에 관한 것이다. 본 발명은 다수의 반도체부품(A)이 일정간격을 두고 탑재된 메거진(M)을 세정진행 상황에 따라 단계적으로 승강시키는 메거진 테이블(100); 상기 메거진 테이블로부터 후방에 설치되어 수평회전하는 로터리스테이지(200); 상기 로터리스테이지로 하강하여 로터리스테이지로 공급된 반도체부품들을 세정하는 플라즈마 세정챔버(300); 상기 메거진 테이블의 전방에 위치되어 메거진이 단계적으로 승강할 때마다 매거진 내부에 탑재된 세정대상이 되는 반도체부품을 후방으로 밀어서 이동시키는 제1이송부재(400); 및 상기 로터리스테이지의 상부에 승강 및 전후방향 이동이 가능하게 설치되어 상기 제1이송부재를 통해 후방으로 이동된 세정대상이 되는 반도체부품을 픽업하여 로터리스테이지로 공급하거나 상기 로터리스테이지의 상부에 놓여진 세정이 완료된 반도체부품을 메거진 테이블로 밀어서 메거진에 단계적으로 탑재시키는 제2이송부재(500)를 포함하여 구성된다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)