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1. (WO2016052632) SAMPLE TRANSFER SYSTEM AND SOLAR CELL PRODUCTION METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2016/052632 International Application No.: PCT/JP2015/077763
Publication Date: 07.04.2016 International Filing Date: 30.09.2015
IPC:
H01L 21/677 (2006.01) ,C23C 16/458 (2006.01) ,H01L 31/0224 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677
for conveying, e.g. between different work stations
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
458
characterised by the method used for supporting substrates in the reaction chamber
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
02
Details
0224
Electrodes
Applicants: KANEKA CORPORATION[JP/JP]; 3-18, Nakanoshima 2-chome, Kita-ku, Osaka-shi, Osaka 5308288, JP
Inventors: MIYAMOTO Minoru; JP
YANAGIHARA Yutaka; JP
MAKITA Hideyuki; JP
Agent: FUJITA Takashi; JP
Priority Data:
2014-20257430.09.2014JP
Title (EN) SAMPLE TRANSFER SYSTEM AND SOLAR CELL PRODUCTION METHOD
(FR) SYSTÈME DE TRANSFERT D'ÉCHANTILLON ET PROCÉDÉ DE PRODUCTION DE CELLULE SOLAIRE
(JA) 試料移載システム及び太陽電池の製造方法
Abstract:
(EN) Provided is a sample transfer system that can prevent a sample from moving in the planar direction during transfer, that can correct the orientation of the sample and experiences few suction failures, and that can eliminate the occurrence of damage during suctioning. The present invention is provided with a sample holding device (20). The sample holding device has contact pins (contact members) (31, 32, 33, 34, 35, 36) that are brought into contact with a portion of a sample, and has movement mechanisms (41, 42, 43, 44) that move the contact pins in a direction that is parallel to a sample holding surface (47). A substrate holder (a sample carrying member) (3) is provided with a predetermined sample carrying region (50) that carries a substrate (10), and with recessed parts (51, 52, 53, 54, 55, 56). The contact pins of the sample holding device (20) enter the recessed parts when the sample holding device (20) has been brought close to the predetermined sample carrying region (50), and a portion of the contact pins moves inside the recessed parts as a result of the movement mechanisms being operated.
(FR) L'invention concerne un système de transfert d'échantillon qui peut empêcher le déplacement d'un échantillon dans la direction plane pendant le transfert, qui peut corriger l'orientation de l'échantillon et ne subit que peu de défaillances d'aspiration, et qui peut éliminer l’occurrence de dommages durant l'aspiration. La présente invention est pourvue d'un dispositif de support d'échantillon (20). Le dispositif de support d'échantillon comprend des broches de contact (éléments de contact) (31, 32, 33, 34, 35, 36) qui sont mises en contact avec une partie d'un échantillon et possède des mécanismes de déplacement (41, 42, 43, 44) qui déplacent les broches de contact dans une direction qui est parallèle à une surface de support d'échantillon (47). Un support de substrat (un élément de support d'échantillon) (3) est pourvu d'une zone de transport d'échantillon prédéterminée (50) qui transporte un substrat (10) et qui est dotée de parties en retrait (51, 52, 53, 54, 55, 56). Les broches de contact du dispositif de support d'échantillon (20) entrent dans les parties en retrait lorsque le dispositif de support d'échantillon (20) a été amené à proximité de la zone de transport d'échantillon prédéterminée (50), et une partie des broches de contact se déplace à l'intérieur des parties en retrait en conséquence de l'actionnement des mécanismes de déplacement.
(JA)  移載中に試料が面方向に移動することを阻止することが可能であり、且つ試料の姿勢を修正することができて吸引の失敗が少なく、且つ吸引時の破損をなくすことができる試料移載システムを提供する。 試料保持装置20を備え、試料保持装置は、試料の一部と接触させる接触ピン(接触部材)31,32,33,34,35,36と、接触ピンを試料保持面47に沿う方向に移動させる移動機構41,42,43,44とを有する。基板ホルダー(試料載置部材)3には、基板10を載置する試料載置予定領域50と、凹部51,52,53,54,55,56が設けられている。試料保持装置20を試料載置予定領域50に近接させた状態の際に試料保持装置20の接触ピンが凹部に入り、移動機構を動作させることによって接触ピンの一部が凹部内で移動する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)