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1. (WO2016052246) ELECTRON BEAM DEPOSITION DEVICE AND THIN FILM FORMATION METHOD

Pub. No.:    WO/2016/052246    International Application No.:    PCT/JP2015/076609
Publication Date: Fri Apr 08 01:59:59 CEST 2016 International Filing Date: Sat Sep 19 01:59:59 CEST 2015
IPC: C23C 14/30
Applicants: MURATA MANUFACTURING CO., LTD.
株式会社村田製作所
Inventors: SUGIMOTO, Yuichi
杉元 祐一
ADACHI, Naoya
足立 直哉
SEKI, Hitoshi
關 仁士
Title: ELECTRON BEAM DEPOSITION DEVICE AND THIN FILM FORMATION METHOD
Abstract:
This electron beam deposition device (100) is provided with: a crucible (14) into which a deposition material is charged; an electron gun (16) for producing an electron beam (20) incident on the deposition material; a magnetic field producing unit (30); and a magnetic shield (40). The magnetic field producing unit (30) produces a first magnetic field (B1) for deflecting electrons reflected from the deposition material. The magnetic shield (40) blocks the first magnetic field (B1) to prevent the first magnetic field (B1) from affecting the path of the electron beam (20).