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1. (WO2016051976) ALUMINUM PLATE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2016/051976 International Application No.: PCT/JP2015/073146
Publication Date: 07.04.2016 International Filing Date: 18.08.2015
IPC:
C25F 3/14 (2006.01) ,C25D 11/20 (2006.01) ,C25F 3/04 (2006.01) ,H01G 11/06 (2013.01) ,H01G 11/70 (2013.01) ,H01M 4/66 (2006.01)
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
F
PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
3
Electrolytic etching or polishing
02
Etching
14
locally
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
11
Electrolytic coating by surface reaction, i.e. forming conversion layers
02
Anodisation
04
of aluminium or alloys based thereon
18
After-treatment, e.g. pore-sealing
20
Electrolytic after-treatment
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
F
PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
3
Electrolytic etching or polishing
02
Etching
04
of light metals
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
G
CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
11
Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
04
Hybrid capacitors
06
with one of the electrodes allowing ions to be reversibly doped thereinto, e.g. lithium-ion capacitors [LICs]
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
G
CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
11
Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
66
Current collectors
70
characterised by their structure
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
M
PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
4
Electrodes
02
Electrodes composed of, or comprising, active material
64
Carriers or collectors
66
Selection of materials
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
川口 順二 KAWAGUCHI Junji; JP
Agent:
渡辺 望稔 WATANABE Mochitoshi; JP
Priority Data:
2014-20051430.09.2014JP
Title (EN) ALUMINUM PLATE
(FR) PLAQUE D’ALUMINIUM
(JA) アルミニウム板
Abstract:
(EN) The present invention addresses the problem of providing an aluminum plate having good coatability and pre-doping properties. The aluminum plate, which has a plurality of through holes that extend through the aluminum plate in the thickness direction, has an average opening diameter for the through holes of 1 µm to 100 µm, a through hole density of 50 holes/mm2 to 2000 holes/mm2, and distances between adjacent through holes of not more than 300 µm.
(FR) La présente invention concerne le problème de fourniture d’une plaque d’aluminium ayant de bonnes propriétés d’aptitude au revêtement et de pré-dopage. La plaque d’aluminium, qui comporte une pluralité de trous traversants qui s’étendant à travers la plaque d’aluminium dans la direction de l’épaisseur, a un diamètre d’ouverture moyen pour les trous traversant de 1 µm à 100 µm, une densité de trous traversant de 50 trous/mm2 à 2000 trous/mm2, et des distances entre des trous traversants adjacents de pas plus de 300 µm.
(JA) 良好な塗布性とプレドープ特性とを有するアルミニウム板を提供することを課題とする。貫厚み方向に貫通する複数の貫通孔を有するアルミニウム板において、通孔の平均開口径が1μm~100μmであり、貫通孔の密度が50個/mm2~2000個/mm2であり、隣接する貫通孔の孔間距離が300μm以下である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)