WO2016030790 OXIME SULFONATE DERIVATIVES

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Publication Number WO/2016/030790

Publication Date 03.03.2016

International Application No. PCT/IB2015/056177

International Filing Date 13.08.2015

IPC

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CPC

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Applicants

BASF SE [DE]/[DE]
BASF (CHINA) COMPANY LIMITED [CN]/[CN] (MN)

Inventors

KUNIMOTO, Kazuhiko
SAMESHIMA, Kaori
KURA, Hisatoshi
MATSUOKA, Yuki

Agents

MAIWALD PATENTANWALTS GMBH

Priority Data

14182828.5

29.08.2014

Publication Language English (en)

Filing Language English (EN)

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Title

(EN) OXIME SULFONATE DERIVATIVES

(FR) DÉRIVÉS DE SULFONATE D'OXIME

Abstract

(EN) Oxime sulfonate compounds of the formula (I), wherein R ₁ is O(CO)R ₄, COOR ₅ or CONR ₆R ₇; n is 1 or 2; R ₂ for example is C ₁-C ₈alkyl, C ₃-C ₆cycloalkyl or benzyl; R ₃ is for example C ₁-C ₈alkyl, C ₃-C ₆cycloalkyl, C ₁-C ₈haloalkyl, C ₂-C ₈alkenyl, benzyl, phenyl or naphthyl, which optionally are substituted; R ₄ is for example C ₁-C ₈alkyl, C ₃-C ₆cycloalkyl, C ₁-C ₈haloalkyl, C ₂-C ₈alkenyl, benzyl, phenyl or naphthyl, which optionally are substituted; R ₅ is for example C ₃-C ₂₀alkyl, C ₃-C ₁₄cycloalkyl, C ₂-C ₈alkenyl, C ₁-C ₁₂alkyl which is substituted for example by one or more halogen; or R ₅ is phenyl or naphthyl, which are unsubstituted; R ₆ and R ₇ each independently of one another for example are hydrogen, C ₁-C ₁₂alkyl, C ₁-C ₄haloalkyl, phenyl-C ₁-C ₄alkyl, C ₂-C ₈alkenyl or C ₃-C ₆cycloalkyl, phenyl or naphthyl; or R ₆ and R ₇, together with the N-atom to which they are attached, form a 5- or 6-membered ring; are suitable as thermal radical initiators.

(FR) La présente invention concerne des composés de sulfonate d'oxime de formule I, dans laquelle R ₁ est O(CO)R ₄, COOR ₅ ou CONR ₆R ₇; n est 1 ou 2; R ₂ est par exemple un groupe alkyle en C ₁-C ₈, un groupe cycloalkyle ou benzyle en C ₃-C ₆; R ₃ est par exemple un groupe alkyle en C ₁-C ₈, un groupe cycloalkyle en C ₃-C ₆, un groupe halogénoalkyle en C ₁-C ₈, un groupe alcényle, benzyle, phényle ou naphtyle en C ₂-C ₈, qui sont facultativement substitués; R ₄ est par exemple un groupe alkyle en C ₁-C ₈, un groupe cycloalkyle en C ₃-C ₆, un groupe halogénoalkyle en C ₁-C ₈, un groupe alcényle, benzyle, phényle ou naphtyle en C ₂-C ₈, qui sont facultativement substitués; R ₅ est par exemple un groupe alkyle en C ₃-C ₂₀, un groupe cycloalkyle en C ₃-C ₁₄, un groupe alcényle en C ₂-C ₈, un groupe alkyle en C ₁-C ₁₂ qui est remplacé par exemple par au moins un halogène; ou R ₅ est un groupe phényle ou naphtyle, qui ne sont pas substitués; R ₆ et R ₇ sont indépendamment l'un de l'autre hydrogène, un groupe alkyle en C ₁-C ₁₂, un groupe halogénoalkyle en C ₁-C ₄, un groupe phényle-C ₁-C ₄alkyle, un groupe alcényle en C ₂-C ₈ ou un groupe cycloalkyle, phényle, ou naphtyle en C ₃-C ₆; ou R ₆ et R ₇, conjointement avec l'atome N auquel ils sont fixés, forment un cycle à 5 ou 6 chaînons; sont appropriés en tant qu'initiateurs radicalaires thermiques.

C	CHEMISTRY; METALLURGY
07	ORGANIC CHEMISTRY
D	HETEROCYCLIC COMPOUNDS
213	Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
02	having three double bonds between ring members or between ring members and non-ring members
04	having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
24	with substituted hydrocarbon radicals attached to ring carbon atoms
54	Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
59	with at least one of the bonds being to sulfur

C	CHEMISTRY; METALLURGY
07	ORGANIC CHEMISTRY
D	HETEROCYCLIC COMPOUNDS
265	Heterocyclic compounds containing six-membered rings having one nitrogen atom and one oxygen atom as the only ring hetero atoms
28	1,4-Oxazines; Hydrogenated 1,4-oxazines
30	not condensed with other rings
32	with oxygen atoms directly attached to ring carbon atoms

C	CHEMISTRY; METALLURGY
07	ORGANIC CHEMISTRY
D	HETEROCYCLIC COMPOUNDS
277	Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
02	not condensed with other rings
20	having two or three double bonds between ring members or between ring members and non-ring members
32	with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
54	Nitrogen and either oxygen or sulfur atoms

C	CHEMISTRY; METALLURGY
07	ORGANIC CHEMISTRY
D	HETEROCYCLIC COMPOUNDS
291	Heterocyclic compounds containing rings having nitrogen, oxygen and sulfur atoms as the only ring hetero atoms
02	not condensed with other rings

C	CHEMISTRY; METALLURGY
07	ORGANIC CHEMISTRY
D	HETEROCYCLIC COMPOUNDS
327	Heterocyclic compounds containing rings having oxygen and sulfur atoms as the only ring hetero atoms
02	one oxygen atom and one sulfur atom
06	Six-membered rings

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1. WO2016030790 - OXIME SULFONATE DERIVATIVES

C	CHEMISTRY; METALLURGY
07	ORGANIC CHEMISTRY
C	ACYCLIC OR CARBOCYCLIC COMPOUNDS
309	Sulfonic acids; Halides, esters, or anhydrides thereof
01	Sulfonic acids
28	having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
29	of non-condensed six-membered aromatic rings
30	of six-membered aromatic rings substituted by alkyl groups

H	ELECTRICITY
01	BASIC ELECTRIC ELEMENTS
L	SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21	Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02	Manufacture or treatment of semiconductor devices or of parts thereof
027	Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165

G	PHYSICS
02	OPTICS
B	OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
1	Optical elements characterised by the material of which they are made
10	Optical coatings produced by application to, or surface treatment of, optical elements
14	Protective coatings, e.g. hard coatings

G	PHYSICS
02	OPTICS
F	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1	Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01	for the control of the intensity, phase, polarisation or colour
13	based on liquid crystals, e.g. single liquid crystal display cells
133	Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333	Constructional arrangements; ; Manufacturing methods
1335	Structural association of cells with optical devices, e.g. polarisers or reflectors
133509	Filters, e.g. light shielding masks
133514	Colour filters
133516	Methods for their manufacture, e.g. printing, electro-deposition or photolithography

G	PHYSICS
03	PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F	PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7	Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
0005	Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
0007	Filters, e.g. additive colour filters; Components for display devices