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1. WO2015133620 - GAS BARRIER FILM

Publication Number WO/2015/133620
Publication Date 11.09.2015
International Application No. PCT/JP2015/056713
International Filing Date 06.03.2015
IPC
B32B 9/00 2006.1
BPERFORMING OPERATIONS; TRANSPORTING
32LAYERED PRODUCTS
BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
C23C 16/42 2006.1
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22characterised by the deposition of inorganic material, other than metallic material
30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
42Silicides
CPC
C23C 16/401
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
22characterised by the deposition of inorganic material, other than metallic material
30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
40Oxides
401containing silicon
C23C 16/505
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
44characterised by the method of coating
50using electric discharges
505using radio frequency discharges
C23C 16/545
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
44characterised by the method of coating
54Apparatus specially adapted for continuous coating
545for coating elongated substrates
Applicants
  • コニカミノルタ株式会社 KONICA MINOLTA, INC. [JP]/[JP]
Inventors
  • 須川 圭一 SUGAWA, Keiichi
Agents
  • 八田国際特許業務法人 HATTA & ASSOCIATES
Priority Data
2014-04392806.03.2014JP
Publication Language Japanese (ja)
Filing Language Japanese (JA)
Designated States
Title
(EN) GAS BARRIER FILM
(FR) FILM BARRIÈRE CONTRE LES GAZ
(JA) ガスバリア性フィルム
Abstract
(EN) Provided is a gas barrier film which has excellent flex resistance and with which a decrease in gas barrier performance can be suppressed even if the gas barrier film is bent. This gas barrier film has a substrate and a gas barrier layer formed according to a chemical vapor deposition method on one surface of the substrate, and is characterized in that a 100 mm x 100 mm-sized sample is placed on a flat surface such that the gas barrier layer is below the substrate, and the warp value which is calculated as the average value obtained by measuring the height at which the four corners are floating from the flat surface is 1-60 mm.
(FR) La présente invention concerne un film barrière contre les gaz qui présente une excellente résistance à la flexion et grâce auquel une diminution de performance de barrière contre les gaz peut être supprimée même si le film barrière contre les gaz est courbé. Le film barrière contre les gaz selon l'invention comprend un substrat et une couche barrière contre les gaz formée selon un procédé de dépôt chimique en phase vapeur sur une surface du substrat et est caractérisé en ce qu'un échantillon d'une taille de 100 mm x 100 mm est placé sur une surface plate de sorte que la couche barrière contre les gaz soit sous le substrat, et la valeur de gauchissement qui est calculée comme la valeur moyenne obtenue par la mesure de la hauteur à laquelle les quatre coins flottent depuis la surface plate est de 1 à 60 mm.
(JA) 耐屈曲性に優れ、ガスバリア性フィルムが屈曲されてもガスバリア性能の低下が抑制されるガスバリア性フィルムを提供する。基材と、前記基材の一方の面に化学蒸着法により形成された、ガスバリア層とを有し、100mm×100mmサイズの試料を前記基材に対して前記ガスバリア層が下になるように平面上に置き、4隅の平面からの浮いている高さを測定した平均値として算出される反りの値が1~60mmであることを特徴とする、ガスバリア性フィルム。
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