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1. WO2015128943 - LASER DEVICE

Publication Number WO/2015/128943
Publication Date 03.09.2015
International Application No. PCT/JP2014/054538
International Filing Date 25.02.2014
IPC
H01S 3/13 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
3Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
13Stabilisation of laser output parameters, e.g. frequency, amplitude
CPC
G02B 19/0095
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
19Condensers, ; e.g. light collectors or similar non-imaging optics
0033characterised by the use
0095for use with ultra-violet radiation
G03F 7/70033
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70008Production of exposure light, i.e. light sources
70033by plasma EUV sources
H01S 3/13
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
3Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
13Stabilisation of laser output parameters, e.g. frequency, amplitude
H01S 3/1305
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
3Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
13Stabilisation of laser output parameters, e.g. frequency, amplitude
1305Feedback control systems
H01S 3/1307
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
3Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
13Stabilisation of laser output parameters, e.g. frequency, amplitude
1307Stabilisation of the phase
H01S 3/2232
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
3Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
14characterised by the material used as the active medium
22Gases
223the active gas being polyatomic, i.e. containing more than one atom
2232Carbon dioxide (CO2) or monoxide [CO]
Applicants
  • ギガフォトン株式会社 GIGAPHOTON INC. [JP]/[JP]
Inventors
  • 野極 誠二 NOGIWA Seiji
  • 若林 理 WAKABAYASHI Osamu
Agents
  • 宇都宮 正明 UTSUNOMIYA Masaaki
Priority Data
Publication Language Japanese (ja)
Filing Language Japanese (JA)
Designated States
Title
(EN) LASER DEVICE
(FR) DISPOSITIF LASER
(JA) レーザ装置
Abstract
(EN) This laser device may be provided with: a beam splitter that splits pulse laser light into a first optical path and a second optical path; an optical sensor which is disposed on the first optical path; an amplifier which includes an amplification region disposed on the second optical path and which amplifies and emits the pulse laser light which is incident along the second optical path; a wavefront controller which is disposed on the second optical path between the beam splitter and the amplifier; and processing devices which receive output signals from the optical sensor and transmit control signals to the wavefront controller.
(FR) La présente invention concerne un dispositif laser pourvu : d'un diviseur de faisceau qui divise la lumière laser pulsée en un premier chemin optique et un second chemin optique ; d'un capteur optique qui est situé sur le premier chemin optique ; d'un amplificateur qui comprend une région d'amplification située sur le second chemin optique et qui amplifie et émet la lumière laser pulsée qui est incidente le long du second chemin optique ; d'un dispositif de commande de front d'onde qui est situé sur le second chemin optique entre le diviseur de faisceau et l'amplificateur ; et de dispositifs de traitement qui reçoivent des signaux de sortie depuis le capteur optique et transmettent des signaux de commande au dispositif de commande de front d'onde.
(JA) このレーザ装置は、パルスレーザ光を第1の光路と第2の光路とに分岐させるビームスプリッタと、第1の光路に配置された光センサと、第2の光路に配置された増幅領域を含み、第2の光路に沿って入射するパルスレーザ光を増幅して出射する増幅器と、ビームスプリッタと増幅器との間の第2の光路に配置された波面制御器と、光センサの出力信号を受信して、波面制御器に制御信号を送信する処理装置と、を備えてもよい。
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