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1. (WO2015125870) PHOTOSENSITIVE RESIN COMPOSITION, CURED OBJECT AND PRODUCTION METHOD THEREFOR, RESIN PATTERN PRODUCTION METHOD, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, INFRARED CUTOFF FILTER, AND SOLID IMAGING DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2015/125870 International Application No.: PCT/JP2015/054631
Publication Date: 27.08.2015 International Filing Date: 19.02.2015
IPC:
G03F 7/004 (2006.01) ,C08F 212/14 (2006.01) ,C08F 220/10 (2006.01) ,G02B 5/20 (2006.01) ,G03F 7/039 (2006.01) ,G03F 7/40 (2006.01) ,H01L 21/027 (2006.01) ,H01L 51/50 (2006.01) ,H05B 33/12 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
212
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
02
Monomers containing only one unsaturated aliphatic radical
04
containing one ring
14
substituted by hetero atoms or groups containing hetero atoms
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10
Esters
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
039
Macromolecular compounds which are photodegradable, e.g. positive electron resists
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
40
Treatment after imagewise removal, e.g. baking
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
12
Light sources with substantially two-dimensional radiating surfaces
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
柏木 大助 KASHIWAGI Daisuke; JP
安藤 豪 ANDOU Takeshi; JP
山田 悟 YAMADA Satoru; JP
河邉 保雅 KAWABE Yasumasa; JP
留場 恒光 TOMEBA Hisamitsu; JP
Agent:
野口 恭弘 NOGUCHI Yasuhiro; JP
Priority Data:
2014-03065320.02.2014JP
Title (EN) PHOTOSENSITIVE RESIN COMPOSITION, CURED OBJECT AND PRODUCTION METHOD THEREFOR, RESIN PATTERN PRODUCTION METHOD, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, INFRARED CUTOFF FILTER, AND SOLID IMAGING DEVICE
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE, ARTICLE DURCI AINSI QUE PROCÉDÉ DE FABRICATION DE CELUI-CI, PROCÉDÉ DE FABRICATION DE MOTIF DE RÉSINE, FILM DURCI, DISPOSITIF D'AFFICHAGE À CRISTAUX LIQUIDES, DISPOSITIF D'AFFICHAGE ÉLECTROLUMINESCENT ORGANIQUE, FILTRE BLOQUANT LES RAYONS INFRAROUGES ET DISPOSITIF D'IMAGERIE À SEMI-CONDUCTEURS
(JA) 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機EL表示装置、赤外線カットフィルター、並びに、固体撮像装置
Abstract:
(EN) The purpose of the present invention is to provide a photosensitive resin composition from which can be obtained a cured object that has excellent opacity and high surface hardness even as a thin film, to provide a cured object, a cured object production method, a cured film, and a cured film production method wherein the photosensitive resin composition is cured, to provide a resin pattern production method, and to provide a liquid crystal display device, an organic EL display device, an infrared cutoff filter, and a solid imaging device that comprise the cured film. A photosensitive resin composition according to the present invention is characterized by containing a polymer component (component A) that includes a polymer that satisfies at least one of (1) and (2), a photoacid generator (component B), a solvent (component C), and titanium black (component S). (1) A polymer that has: a structural unit (a1) that has a group wherein an acid group is protected by an acid-labile group; and a structural unit (a2) that has a cross-linkable group. (2) A polymer (a1) that has a structural unit that has a group wherein an acid group is protected by an acid-labile group, and a polymer (a2) that has a structural unit that has a cross-linkable group.
(FR) L'invention a pour objectif de fournir une composition de résine photosensible permettant d'obtenir un article durci qui tout en consistant en un film mince se révèle d'une excellente opacité et présente une dureté de surface élevée, un article durci tel que ladite composition de résine photosensible est durcie, un film durci ainsi que le procédé de fabrication de celui-ci, un procédé de fabrication de motif de résine, un dispositif d'affichage à cristaux liquides possédant ledit film durci, un dispositif d'affichage électroluminescent organique, un filtre bloquant les rayons infrarouges et un dispositif d'imagerie à semi-conducteurs. La composition de résine photosensible de l'invention est caractéristique en ce qu'elle comprend (composant A) un composant polymère contenant un polymère satisfaisant au moins (1) et (2), (composant B) un générateur de photoacide, (composant C) un solvant et (composant S) un noir de titane. (1) Le polymère possède (a1) une unité structurelle possédant un groupe tel qu'un groupe acide est protégé par un groupe décomposable par un acide, et (a2) une unité structurelle possédant un groupe réticulable. (2) Le polymère possède (a1) une unité structurelle possédant un groupe tel qu'un groupe acide est protégé par un groupe décomposable par un acide, et (a2) le polymère possède une unité structurelle possédant un groupe réticulable.
(JA)  薄膜でありながら遮光性に優れ、かつ表面硬度が高い硬化物が得られる感光性樹脂組成物、上記感光性樹脂組成物を硬化させた硬化物、硬化膜及びその製造方法、樹脂パターン製造方法、並びに、上記硬化膜を有する液晶表示装置、有機EL表示装置、赤外線カットフィルター及び固体撮像装置を提供することを目的とする。 本発明の感光性樹脂組成物は、(成分A)(1)及び(2)の少なくとも一方を満たす重合体を含む重合体成分、(成分B)光酸発生剤、(成分C)溶剤、並びに、(成分S)チタンブラック、を含有することを特徴とする。 (1)(a1)酸基が酸分解性基で保護された基を有する構成単位及び(a2)架橋性基を有する構成単位、を有する重合体 (2)(a1)酸基が酸分解性基で保護された基を有する構成単位を有する重合体、及び、(a2)架橋性基を有する構成単位を有する重合体
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)