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1. (WO2015125572) THIOPYRANOSE COMPOUND AND METHOD FOR PRODUCING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2015/125572    International Application No.:    PCT/JP2015/052304
Publication Date: 27.08.2015 International Filing Date: 28.01.2015
Chapter 2 Demand Filed:    08.07.2015    
IPC:
C07D 335/02 (2006.01), C07C 49/16 (2006.01), C07C 69/78 (2006.01), C07C 309/68 (2006.01), C07C 309/73 (2006.01)
Applicants: FUJIFILM CORPORATION [JP/JP]; 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620 (JP)
Inventors: TAKEDA, Akira; (JP).
WATANABE, Toru; (JP).
KATSUMATA,Taiji; (JP).
ITO, Takayuki; (JP).
SAWADA, Toshihiko; (JP)
Agent: IIDA, Toshizo; (JP)
Priority Data:
2014-029978 19.02.2014 JP
Title (EN) THIOPYRANOSE COMPOUND AND METHOD FOR PRODUCING SAME
(FR) COMPOSÉ THIOPYRANOSE ET SON PROCÉDÉ DE PRODUCTION
(JA) チオピラノース化合物およびその製造方法
Abstract: front page image
(EN)A method for producing a thiopyranose compound represented by formula (2), which comprises reacting a compound represented by formula (1) with a sulfur compound. X represents a leaving group; A represents an oxygen atom or a sulfur atom; and R1A to R4B, R1B to R4B and R5 independently represent a hydrogen atom or a specific substituent.
(FR)Procédé de production d'un composé thiopyranose représenté par la formule (2), qui consiste à faire réagir un composé représenté par la formule (1) avec un composé soufre. X représente un groupe partant; A représente un atome d'oxygène ou un atome de soufre; et R1A à R4B, R1B à R4B et R5 représentent indépendamment un atome d'hydrogène ou un substituant spécifique.
(JA) 下記式(1)で表される化合物と硫黄化合物とを反応させる下記式(2)で表されるチオピラノース化合物の製造方法。Xは脱離基を表す。 Aは、酸素原子または硫黄原子を表す。 R1A~R4B、R1B~R4B、Rは水素原子または特定の置換基を表す。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)