JP2015051312 LUMINESCENT THIN FILM LAMINATE, METHOD FOR PRODUCING LUMINESCENT THIN FILM LAMINATE, ORGANIC ELECTROLUMINESCENT ELEMENT AND METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT ELEMENT

1. (WO2015125533) LUMINESCENT THIN FILM LAMINATE, METHOD FOR PRODUCING LUMINESCENT THIN FILM LAMINATE, ORGANIC ELECTROLUMINESCENT ELEMENT AND METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT ELEMENT

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Latest bibliographic data on file with the International Bureau

Pub. No.:		WO/2015/125533		International Application No.:		PCT/JP2015/051312
Publication Date:		27.08.2015		International Filing Date:		20.01.2015

IPC:

H05B 33/12 (2006.01), H01L 51/50 (2006.01), H05B 33/10 (2006.01)

Applicants:

KONICA MINOLTA, INC. [JP/JP]; 2-7-2, Marunouchi, Chiyoda-ku, Tokyo 1007015 (JP)

Inventors:

OIKAWA Kazuhiro; (JP).
IWASAKI Toshihiko; (JP)

Agent:

SHIN-YU INTERNATIONAL PATENT FIRM; Sasazuka Center Bldg., 2-1-6, Sasazuka, Shibuya-ku, Tokyo 1510073 (JP)

Priority Data:

2014-031442

21.02.2014

Title

(EN) LUMINESCENT THIN FILM LAMINATE, METHOD FOR PRODUCING LUMINESCENT THIN FILM LAMINATE, ORGANIC ELECTROLUMINESCENT ELEMENT AND METHOD FOR MANUFACTURING ORGANIC ELECTROLUMINESCENT ELEMENT
(FR) STRATIFIÉ DE FILM MINCE LUMINESCENT, PROCÉDÉ DE PRODUCTION DE STRATIFIÉ DE FILM MINCE LUMINESCENT, ÉLÉMENT ÉLECTROLUMINESCENT ORGANIQUE ET PROCÉDÉ DE FABRICATION D'ÉLÉMENT ÉLECTROLUMINESCENT ORGANIQUE
(JA) 発光性薄膜積層体、発光性薄膜積層体の製造方法、有機エレクトロルミネッセンス素子、及び、有機エレクトロルミネッセンス素子の製造方法

Abstract:

(EN)This luminescent thin film laminate is configured to comprise: an ALD thin film layer that is formed by an atomic layer deposition method and includes at least one luminescent organic semiconductor thin film; and at least one organic layer that is formed above the ALD thin film layer by a wet method.
(FR)La présente invention concerne un stratifié de film mince luminescent conçu pour comprendre : une couche de film mince ALD qui est formée par un procédé de dépôt de couche atomique et qui comprend au moins un film mince semi-conducteur luminescent organique ; et au moins une couche organique qui est formée au-dessus de la couche de film mince ALD par un procédé humide.
(JA)　少なくとも１層以上の発光性有機半導体薄膜を含み、原子堆積法（Atomic Layer Deposition）により形成されたＡＬＤ薄膜層と、ＡＬＤ薄膜層よりも上層に湿式法で形成された、少なくとも１層以上の有機層とを備える発光性薄膜積層体を構成する。

Designated States:

AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).

Publication Language:	Japanese (JA)
Filing Language:	Japanese (JA)

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