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Pub. No.:    WO/2015/124372    International Application No.:    PCT/EP2015/051352
Publication Date: 27.08.2015 International Filing Date: 23.01.2015
G03F 7/20 (2006.01), H05G 2/00 (2006.01)
Applicants: ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 NL-5500 AH Veldhoven (NL)
Inventors: VAN SCHOOT, Jan, Bernard, Plechelmus; (NL).
CUPERUS, Minne; (NL).
YAKUNIN, Andrei, Mikhailovich; (NL)
Agent: VAN OS, Lodewijk; (NL)
Priority Data:
14156364.3 24.02.2014 EP
14173121.6 19.06.2014 EP
Abstract: front page image
(EN)A lithographic system comprising a lithographic apparatus (LA) with an anamorphic projection system (PS), and a radiation source (SO) configured to generate an EUV radiation emitting plasma at a plasma formation location (4), the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis (OA) of the radiation source (SO).
(FR)La présente invention a trait à un système lithographique qui comprend un appareil lithographique comportant un système de projection anamorphique, et une source de rayonnement conçue pour générer un plasma émetteur de rayonnement EUV à un emplacement de formation de plasma, le plasma émetteur de rayonnement EUV ayant une forme allongée dans un plan sensiblement perpendiculaire à l'axe optique de la source de rayonnement.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)